Abstract
Non-isothermal plasma sources under the presence of a gas flow are currently used in many surface processing applications. For this reason, the modelling of these discharges is of fundamental importance in order to understand the heavy-particle kinetics and the transport of species under gas flowing conditions. This paper is an extension of previous work carried out by our group [1–4] on the kinetic modeling of oxygen discharges to account for the effects of gas flow. Here, we present a basic model describing the main electron and heavy-particle kinetic and transport processes in a microwave discharge and we determine the axial concentration profiles, the steady-state discharge maintenance field and mean absorbed power per electron, and the axial distribution of the gas temperature as a function of the up-stream pressure, p (up to 3 Torr), the gas flow rate and the frequency of the sustaining field (390 to 2450 MHz).
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© 1996 Kluwer Academic Publishers
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Pinheiro, M.J., Ferreira, C.M., Gousset, G. (1996). Multicomponent Reactive Gas Dynamic Model for Low-Pressure Discharges in Flowing Oxygen. In: Capitelli, M. (eds) Molecular Physics and Hypersonic Flows. NATO ASI Series, vol 482. Springer, Dordrecht. https://doi.org/10.1007/978-94-009-0267-1_31
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DOI: https://doi.org/10.1007/978-94-009-0267-1_31
Publisher Name: Springer, Dordrecht
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