Microstructures Produced by Chemical Etching of Finely Scratched Silicon

Harea, Eugen

doi:10.1007/978-94-007-0903-4_6

Eugen Harea⁶

Part of the book series: NATO Science for Peace and Security Series B: Physics and Biophysics ((NAPSB))

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Abstract

Today, microstructures produced by mechanical forming of various materials are widely used in micro- and nanotechnology. Frequently the mechanical forming is combined with chemical etching of surfaces [Grabco et al., Phys. Stat. Sol. (c), 6:1295, 2009]. To improve the behaviour of indium tin oxide/silicon photosensors (ITO/Si), it is desirable to increase the ITO/silicon contact area. For this purpose the (001) surface of the Si substrates was scratched in different directions by abrasives. Thereafter, the specimens were subjected to selective chemical etching. The etch-pit patterns obtained were rectangular or square, with the sides oriented along the <100> direction. The dimensions of etch-pit patterns depended on the chemical treatment duration; they enlarge with increasing treatment time.

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References

D. Grabco, O. Shikimaka, E. Harea, N. Gehm, Th. Schimmel and Th. Koch, Phys. Stat. Sol. (c) 6, 1295 (2009).
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Authors and Affiliations

Institute of Applied Physics, Academy of Sciences of Moldova, Str. Academiei 5, Chisinau, MD-2028, Moldova
Eugen Harea

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Eugen Harea
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Correspondence to Eugen Harea .

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Editors and Affiliations

, Inst. of Nanostructure Tech. & Analytics, University of Kassel, Heinrich-Plett-Str. 40, Kassel, 34132, Germany
Johann Peter Reithmaier
, Faculty of Technology and Metallurgy, University "Sts. Cyril and Methodius", Rugjer Boskovic 16, Skopje, 1000, Macedonia
Perica Paunovic
, Dept. of Mathematics and Natural Science, University of Kassel, Heinrich-Plett-Str. 40, Kassel, 34132, Germany
Wilhelm Kulisch
, Inst. of Nanostructure Technologies and, University of Kassel, Heinrich-Plett-Str. 40, Kassel, 34132, Germany
Cyril Popov
Technology & Metallurgy, Dept. Physics, University of Chemical, St. Kliment Ohridski Blvd. 8, Sofia, 1756, Bulgaria
Plamen Petkov

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Harea, E. (2011). Microstructures Produced by Chemical Etching of Finely Scratched Silicon. In: Reithmaier, J., Paunovic, P., Kulisch, W., Popov, C., Petkov, P. (eds) Nanotechnological Basis for Advanced Sensors. NATO Science for Peace and Security Series B: Physics and Biophysics. Springer, Dordrecht. https://doi.org/10.1007/978-94-007-0903-4_6

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DOI: https://doi.org/10.1007/978-94-007-0903-4_6
Published: 23 March 2011
Publisher Name: Springer, Dordrecht
Print ISBN: 978-94-007-0902-7
Online ISBN: 978-94-007-0903-4
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)

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