Growth of Particles in a Plasma

  • Mahendra Singh Sodha
Part of the Springer Series on Atomic, Optical, and Plasma Physics book series (SSAOPP, volume 81)


The presence of particles in a plasma reactor is of serious concerns to microelectronic industry, material science, and other areas. Dust in plasma reactors causes irrecoverable defects and line shorts in large-scale integrated circuits. However, the emphasis has recently changed from considering dust as a process killer to recognizing it as a desired feature with numerous applications like (i) plasma-assisted assembly of carbon-based nanostructures, (ii) plasma-enhanced CVD of nanostructure silicon-based films, (iii) high rate deposition of clusters and particles on nanostructure films, etc. A discussion of the deleterious and beneficial aspects of complex plasma in micro electronic industry has been given in the classic book by Vladimirov et al. [4]. For a rational design of such applications, it is necessary to have an appreciation of the physics and chemistry of the formation and growth of the dust particles in a plasma.


Dust Particle Neutral Atom Dusty Plasma Plasma Reactor Neutral Species 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


  1. 1.
    P. Haaland, A. Garscadden, B. Ganguly, Appl. Phys. Lett. 69, 904 (1996)ADSCrossRefGoogle Scholar
  2. 2.
    M.J. Perrin, C. Hollenstein, in Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, ed. by A. Boucherville Sources and Growth of Particles (Wiley, New York, 1999)Google Scholar
  3. 3.
    M.S. Sodha, S. Misra, S.K. Mishra, S. Srivastava, J. Appl. Phys. 107, 103307 (2010)ADSCrossRefGoogle Scholar
  4. 4.
    S.V. Vladimirov, K. Ostrikov, A.A. Samarian, Physics and Applications of Complex Plasmas (Imperial College Press, London, 2005)Google Scholar
  5. 5.
    A.V. Gurevich, Some nonlinear phenomena in the ionosphere (Springer, New York, 1978)Google Scholar
  6. 6.
    K. Ostrikov, Plasma Nanoscience, Wiley VCH (2008)Google Scholar

Copyright information

© Springer India 2014

Authors and Affiliations

  1. 1.Department of Education BuildingUniversity of LucknowLucknowIndia

Personalised recommendations