Skip to main content
SpringerLink
Log in

Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering

  • Chapter
  • First Online:
ZnO Nanocrystals and Allied Materials

Part of the book series: Springer Series in Materials Science ((SSMATERIALS,volume 180))

Abstract

Inductively coupled plasma (ICP) assisted DC sputter deposition was used for the deposition of Al-doped ZnO (AZO or ZnO:Al) thin films. With increasing ICP RF power, film properties including deposition rate, crystallinity, transparency, and resistivity were improved. To understand the plasma-surface interaction, several plasma diagnostics were performed. Heat fluxes to the substrate were measured by thermal probes, number densities of sputtered metallic atom species were measured by absorption spectroscopy using hollow cathode lamps (HCL) and light emitting diodes (LEDs), and neutral gas temperatures were measured by external cavity diode laser (ECDL) absorption spectroscopy. As a result, it was revealed that the high-density ICP heated the substrate through a high heat flux to the substrate, resulting in a high-quality film deposition without the need for intentional substrate heating. The heat flux to the substrate was predominantly contributed by the plasma charged species, not by the neutral Ar atoms which were also significantly heated in the ICP. The substrate position where the highest quality films were obtained was found to coincide with the position where the substrate heat flux took the maximum value.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Log in via an institution
eBook
USD 16.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book
USD 109.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

References

  1. K.L. Chopra, S. Major, D.K. Pandya, Thin Solid Films 102, 1–46 (1982)

    Google Scholar 

  2. T. Minami, H. Sato, K. Ohashi, T. Tomofuji, S. Takata, J. Cryst. Growth 117, 370–374 (1992)

    Article  ADS  Google Scholar 

  3. K. Ellmer, A. Klein, B. Rech, Transparent conductive zinc oxide: basics and applications in thin film solar cells (Springer, Berlin, 2008)

    Book  Google Scholar 

  4. S. Lany, A. Zunger, Phys. Rev. Lett. 98, 045501 (2007) [4 pages]

    Google Scholar 

  5. K. Ellmer, R. Mientus, Thin Solid Films 516, 5829–5835 (2008)

    Article  ADS  Google Scholar 

  6. B. Szyszka, in Transparent conductive zinc oxide: basics and applications in thin film solar cells, ed. K. Ellmer, A. Klein, B. Rech (Springer, Berlin, 2008), pp. 187–233

    Google Scholar 

  7. K. Iwata, T. Sakemi, A. Yamada, P. Fons, K. Awai, T. Yamamoto, M. Matsubara, H. Tampo, S. Niki, Thin Solid Films 445, 274–277 (2003)

    Article  ADS  Google Scholar 

  8. K. Yamaya, Y. Yamaki, H. Nakanishi, S. Chichibu, Appl. Phys. Lett. 72, 235–237 (1998)

    Article  ADS  Google Scholar 

  9. Y.H. Han, S.J. Jung, J.J. Lee, J.H. Joo, Surf. Coat. Technol. 174–175, 235–239 (2003)

    Article  Google Scholar 

  10. S.J. Jung, Y.H. Han, B.M. Koo, J.J. Lee, J.H. Joo, Thin Solid Films 475, 275–278 (2005)

    Google Scholar 

  11. S. Iwai, Y. Matsuda, M. Shinohara, H. Fujiyama, in Abstracts and Full-Paper CD of the 18th International Symposium on Plasma Chemistry, Kyoto, Japan, August 26–31 2007, 396 [4 pages]

    Google Scholar 

  12. Y. Matsuda, R. Kan, T. Iwata, K. Komine, K. Uehara, T. Shibasaki, M. Shinohara, in Proceedings CD of the 19th International Symposium on Plasma Chemistry (ISPC19), edited by A. von Keudell, J. Winter, M. Boke, V. Schulz-von der Gathen, Bochum, Germany, July 26–31 2009, P.2.2.20 [4 pages]

    Google Scholar 

  13. S. Fay, A. Shah, in Transparent Conductive Zinc Oxide: Basics and Applications in Thin Film Solar Cells, ed. K. Ellmer, A. Klein, B. Rech (Springer, Berlin, 2008), pp. 235–302

    Google Scholar 

  14. M. Lorentz, in Transparent Conductive Zinc Oxide: Basics and Applications in Thin Film Solar Cells, ed. K. Ellmer, A. Klein, B. Rech (Springer, Berlin, 2008), pp. 303–357

    Google Scholar 

  15. A. Kuroyanagi, Jpn. J. Appl. Phys. 28, 219–222 (1989)

    Article  ADS  Google Scholar 

  16. A.F. Aktaruzzaman, G.L. Sharma, L.K. Malhotra, Thin Solid Films 198, 67–74 (1991)

    Google Scholar 

  17. W. Tang, D.C. Cameron, Thin Solid Films 238, 83–87 (1994)

    Google Scholar 

  18. M. Kemell, F. Dartigues, M. Ritala, M. Leskelä, Thin Solid Films 434, 20–23 (2003)

    Article  ADS  Google Scholar 

  19. M. Yamashita, Jpn. J. Appl. Phys. 26, 721–727 (1987)

    Article  ADS  Google Scholar 

  20. S.M. Rossnagel, J. Hopwood, Appl. Phys. Lett. 63, 3285–3287 (1993)

    Article  ADS  Google Scholar 

  21. J. Hopwood, F. Qian, J. Appl. Phys. 78, 758–765 (1995)

    Article  ADS  Google Scholar 

  22. Y. Matsuda, Y. Koyama, K. Tashiro, H. Fujiyama, Thin Solid Films 435, 154–160 (2003)

    Google Scholar 

  23. Y. Matsuda, M. Iwaya, Y. Koyama, M. Shinohara, H. Fujiyama, Thin Solid Films 457, 64–68 (2004)

    Article  ADS  Google Scholar 

  24. A. Anders, Thin Solid Films 502, 22–28 (2006)

    Google Scholar 

  25. A.L. Garner, Appl. Phys. Lett. 92, 011505 (2008) [3 pages]

    Google Scholar 

  26. S. Iwai, Y. Matsuda, M. Shinohara, H. Fujiyama, in Abstracts and Full-Paper CD of the 18th International Symposium on Plasma Chemistry, Kyoto, Japan, 26–31 August 2007 [4 pages]

    Google Scholar 

  27. Y. Matsuda, R. Kan, T. Iwata, K. Komine, K. Uehara, T. Shibasaki, M. Shinohara, in Proceeding CD of the 19th International Symposium on Plasma Chemistry (ISPC19), edited by A. von Keudell, J. Winter, M. Boke, V. Schulz-von der Gathen, Bochum, Germany, 26–31 July 2009, P. 2.2.20 [4 pages]

    Google Scholar 

  28. Y. Matsuda, R. Kan, T. Iwata, T. Kitagawa, R. Shindo, M. Shinohara, in Abstract Book of the 5th DAE-BRNS National Symposium on Pulsed Laser Deposition of Thin Films and Nanostructured Materials (PLD-2009), IIT Madras, Chennai India, IRT11, 2–4 December 2009, p 27

    Google Scholar 

  29. Y. Matsuda, R. Shindo, A. Hirashima, M. Shinohara, Inductively Coupled Plasma Assisted Sputter-Deposition of Al-doped ZnO Thin Films, Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris France, 4–8 October 2010, Volume 55, Number 7, DTP.00036 [2 pages]

    Google Scholar 

  30. Y. Matsuda, A. Hirashima, K. Mine, T. Hashimoto, D. Matsuoka, M. Shinohara, T. Okada, Deposition of Transparent Conductive Aluminum-Doped ZnO Films Using RF Superposed DC Sputtering, Joint IIT Madras-Japan Symposium on ZnO nano-crystals and related materials, IIT-Madras Madras India, 8–10 January 2012 [1page]

    Google Scholar 

  31. R. Dsa, K. Adhikary, S. Ray: Jpn. J. Appl. Phys. 47(3), 1501–1506 (2008)

    Google Scholar 

  32. H. Kersten, G.M.W. Kroesen, R. Hippler, Thin Solid Films 332, 282–289 (1998)

    Article  ADS  Google Scholar 

  33. H. Kersten, D. Rohde, J. Berndt, H. Deutsch, R. Hippler, Thin Solid Films 377–378, 585–591 (2000)

    Article  Google Scholar 

  34. H. Kersten, E. Stoffels, W.W. Stoffels, M. Otte, C. Csambal, H. Deutsch, R. Hippler, J. Appl. Phys. 87, 3637–3645 (2000)

    Google Scholar 

  35. H. Kersten, H. Deutsch, H. Steffen, G.M.W. Kroesen, R. Hippler, Vacuum 63, 385–431 (2001)

    Article  Google Scholar 

  36. A.L. Thomann, N. Semmar, R. Dussrt, J. Mathias, Rev. Sci. Instrum. 77, 033501 (2006)

    Article  ADS  Google Scholar 

  37. R. Dussart, A.L. Thomann, Appl. Phys. 93, 131502 (2008)

    ADS  Google Scholar 

  38. R. Wendt, K. Ellmer, K. Wiesemann, J. Appl. Phys. 82, 2115–2122 (1997)

    Google Scholar 

  39. L. Sirghi, G. Popa, Y. Hatanaka, Thin Solid Films 515, 1334–1339 (2006)

    Article  ADS  Google Scholar 

  40. H. Matsuura, T. Jida, Contrib. Plasma Phys. 46, 406–410 (2006)

    Article  ADS  Google Scholar 

  41. Y. Matsuda, H. Kitagawa, K. Mine, M. Shinohara, Bulletin of the American Physical Society, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris France, 4–8 October 2010, Volume 55, Number 7, CTP.00010 (2010) [2 pages]

    Google Scholar 

  42. H. Kitagawa, R. Kan, K. Mine, M. Shinohara, Y. Matsuda, in TENCON 2010 IEEE Region 10 Conference, Fukuoka Japan, 21–24 November 2010. T2-5.P2, pp. 2208–2212 (ISBN: 978-1-4244-6888-1

    Google Scholar 

  43. H. Kitagawa, K. Mine, M. Shinohara, Y. Matsuda, T. Okada, in Proceeding of the 20th International Symposium on Plasma Chemistry (ISPC20), Philadelphia USA, 24–29 July 2011, FDM56, ID537 [4 pages]

    Google Scholar 

  44. Vladimir N. Ochkin, Spectroscopy of Low Temperature Plasma (Wiley-VCH, Germany, 2009)

    Book  Google Scholar 

  45. A. Kono, S. Takashima, M. Hori, T. Goto, J. Nucl. Mater. 76, 460–464 (2000)

    Google Scholar 

  46. E. Castanos-Martinez, M. Moisan, Spectrochimica Acta Part B 65, 199–209 (2010)

    Article  ADS  Google Scholar 

  47. T. Iwata, R. Shindo, M. Shinohara, Y. Matsuda, in Proceedings of 31st International Symposium on Dry Process, Busan Exhibition and Convention Center, Busan, Korea, 24–25 September 2009, 5-P11, pp. 151–152

    Google Scholar 

  48. T. Iwata, R. Sindo, K. Komine, M. Shinohara, Y. Matsuda, in Proceedings CD of the 27th Symposium on Plasma Processing, Kaiyo Kinen Kaikan, Yokohama, 1–3 February 2010, P1–15, pp. 157–158

    Google Scholar 

  49. R. Shindo, T. Iwata, A. Hirashima, M. Shinohara, Y. Matsuda, in TENCON 2010 IEEE Region 10 Conference, Fukuoka Japan, 21–24 November 2010, T2-7.3, pp. 1002–1006 (ISBN: 978-1-4244-6888-1)

    Google Scholar 

  50. G. Cunge, D. Vempaire, M. Touzeau, N. Sadeghi, Appl. Phys. Lett. 91, 231503 (2007) [3 pages]

    Google Scholar 

  51. R. Shindo, A. Hirashima, M. Shinohara, Y. Matsuda, K. Sakai, T. Okada, in Proceedings of the 20th International Symposium on Plasma Chemistry (ISPC20), Philadelphia USA, 24–29 July 2011, FDM55, ID536 [4 pages]

    Google Scholar 

  52. G.V. Samsonov, “The Oxide Hand Book” chapter II (IFI/PLENUM, New York, 1973)

    Google Scholar 

  53. K. Tachibana, H. Harima, Y. Urano, J. Phys. B: At. Mol. Phys. 15, 3169 (1982)

    Article  ADS  Google Scholar 

  54. K.B. MacAdam, A. Steinbach, C. Wieman, Am. J. Phys. 60(12), 1098–1111 (1992)

    Article  ADS  Google Scholar 

  55. D. Wandt, M. Laschek, K. Przyklenk, A. Tunnermann, H. Welling, Opt. Com. 130, 81–84 (1996)

    Google Scholar 

  56. S. Eriksson, A.E.M. Lindberg, B. Stahlberg, Opt. Laser Technol. 31, 473–477 (1999)

    Article  ADS  Google Scholar 

  57. X.M. Zhang, A.Q. Liu, C. Lu, D.Y. Tang, J. Quant. Electron. 41(2), 187–197 (2005)

    Article  ADS  Google Scholar 

  58. B. Mroziewicz, Opto-Electron. Rev. 16–4, 347–366 (2008)

    Article  ADS  Google Scholar 

  59. L. Hildebrandt, R. Knispel, S. Stry, J.R. Sacher, F. Schael, Appl. Opt. 42(12), 2110–2118 (2003)

    Google Scholar 

  60. R.F. Boivina, E.E. Scime, Rev. Sci. Instrum. 74, 4352–4361 (2003)

    Article  ADS  Google Scholar 

  61. A. Bol’shakov, B.A. Cruden, Technical Physics 53(11), 1423–1432 (2008)

    Google Scholar 

  62. M. Wolter, H.T. Do, H. Steffen, R. Hippler, J. Phys. D: Appl. Phys. 38, 2390–2395 (2005)

    Article  ADS  Google Scholar 

  63. K. Sasaki, Y. Okumura, R. Asaoka, Int. J. Spectrosc. (2010). doi: 10.1155/2010/627571

    Google Scholar 

  64. M.W. Kiehlbauch, D.B. Graves, Appl. Phys. 91, 3539–3546 (2002)

    Article  Google Scholar 

  65. D.B. Hash, D. Bose, M.V.V.S. Rao, B. A. Cruden, M. Meyyappan, S.P. Sharma, J. Appl. Phys. 90 (5), 2148–2157 (2001)

    Google Scholar 

  66. N. Itagaki, K. Kuwahara, K. Nakahara, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Appl. Phys. Exp. 4, 011101 (2011) [2 pages]

    Google Scholar 

Download references

Acknowledgments

The authors wish to thank T. Iwata, K. Komine, R. Kan, K. Uehara, R. Shindo, H. Kitagawa for their help in the experiment, and Prof. K. Sakai of Miyazaki University for performing the XRD and XPS analyses of AZO films. This research was partially supported by a Grant-in-Aid for Scientific Research (C) from the Japan Society for the Promotion of Science (No. 20540485) in 2008–2010 and by Special Coordination Funds for Promoting Science and Technology sponsored by Japan Science and Technology Agency (JST) in 2009–2011.

Author information

Authors and Affiliations

  1. Graduate School of Engineering, Nagasaki University, Bunkyo 1-14, Nagasaki, 852-8131, Japan

    Yoshinobu Matsuda, Takuhiro Hashimoto, Daichi Matsuoka & Masanori Shinohara

  2. Graduate School of Science and Technology, Nagasaki University, Bunkyo 1-14, Nagasaki, 852-8131, Japan

    Akinori Hirashima & Kenji Mine

  3. Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka, 812-8581, Japan

    Tatsuo Okada

Authors
  1. Yoshinobu Matsuda
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Akinori Hirashima
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Kenji Mine
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Takuhiro Hashimoto
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Daichi Matsuoka
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. Masanori Shinohara
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. Tatsuo Okada
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Yoshinobu Matsuda .

Editor information

Editors and Affiliations

  1. Department of Physics, Indian Institute of Technology Madras, Chennai, Tamil Nadu, India

    M S Ramachandra Rao

  2. Dept. of Electrical Engineering, Kyushu University, Fukuoka, Japan

    Tatsuo Okada

Rights and permissions

Reprints and permissions

Copyright information

© 2014 Springer India

About this chapter

Cite this chapter

Matsuda, Y. et al. (2014). Deposition of Aluminum-Doped ZnO Films by ICP-Assisted Sputtering. In: Rao, M., Okada, T. (eds) ZnO Nanocrystals and Allied Materials. Springer Series in Materials Science, vol 180. Springer, New Delhi. https://doi.org/10.1007/978-81-322-1160-0_6

Download citation

  • DOI: https://doi.org/10.1007/978-81-322-1160-0_6

  • Published:

  • Publisher Name: Springer, New Delhi

  • Print ISBN: 978-81-322-1159-4

  • Online ISBN: 978-81-322-1160-0

  • eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)

Publish with us

Policies and ethics

Search

Navigation