Synthesis of Polycrystalline Silicon Carbide (SiC) Thin Films Using Pulsed Laser Deposition

  • B. Venkataramesh
  • Nilesh J. Vasa
Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 180)


Silicon carbide (SiC), similar to diamond and other ceramic materials, is a material with excellent functional properties. SiC films based devices can be used for various applications ranging from automobile, aerospace industry, power delivery systems, photovoltaic, and microelectromechanical systems. The growth of bulk single crystals of SiC is difficult, but several techniques, such as chemical vapor deposition (CVD), electron beam CVD (EB-CVD), pulsed laser deposition (PLD), are used to produce SiC thin films for various functional applications. In the PLD technique, high substrate temperature (>600 °C) is required to produce crystalline SiC thin films and the onset of the large-scale crystallization has been detected above 800 °C. The PLD technique has been extended for SiC film deposition on various substrates, such as Si (100), alkali-free glass materials. A review on PLD of SiC thin film clearly show that it is possible to deposit 3C-SiC (β-SiC) and 4H-SiC (α-SiC) thin films by controlling various process parameters, such as laser fluence and substrate temperature. Recent advances in the PLD technique combined with the surface annealing can improve the characteristics of SiC thin films for photovoltaic and electronic device-related applications.


Substrate Temperature Pulse Laser Deposition Laser Fluence Chemical Vapor Deposition Technique Pulse Laser Deposition Technique 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.



Authors are grateful to Prof. M. Singaperumal (IIT Madras) and Dr. I. A. Palani (IIT Indore) for their discussions at various stages. Authors are also grateful to Mr. Xavier from Carborundum Universal Ltd., India for providing SiC powder with different grit sizes.


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Copyright information

© Springer India 2014

Authors and Affiliations

  1. 1.Department of Engineering DesignIndian Institute of Technology MadrasChennaiIndia

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