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Orientation and morphology control for a-axis YBa2Cu3Oy and PrBa2Cu3Oy thin films on SrTiO3(100) substrate

  • Toshihiko Nagano
  • Tatsunori Hashimoto
  • Jiro Yoshida
Conference paper

Abstract

The substrate temperature and the deposition rate dependences of epitaxial growth of YBa2Cu3Oy (YBCO), PrBa2Cu3Oy (PBCO) and YBCO/PBCO/YBCO trilayer thin films on SrTiO3 (100) substrates have beer investigated by XRD, HRSEM and TEM observations. It was revealed that cubic phase films with high crystallinity was grown at relatively low substrate temperature for the Y-Ba-Cu-O, but at high deposition rate for the Pr-Ba-Cu-O systems, respectively. These cubic-phase films have been successfully utilized as buffer layers to grow high quality trilayer structures. The trilayers fabricated with the cubic-PBCO buffer layer had the best surface morphology and, furthermore, the results of XRD measurements indicated that PBCO barrier layers have b-axis orientation in which the Cu-O chain is normal to the substrate.

Keywords

Buffer Layer YBCO Film Barrier Thickness YBCO Thin Film YBCO Layer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    Hashimoto T, Sagoi M, Mizutani Y, Yoshida J, Mizushima K (1991) Appl.Phys.Lett. 60: 1756CrossRefGoogle Scholar
  2. 2.
    Suzuki Y, Triscone JM, Eom CB, Beasley MR, Geballe TH (1994) Phys.Rev.Lett. 73: 328CrossRefGoogle Scholar
  3. 3.
    Mukaida M, Miyazawa S (1993) Jpn.J.Appl.Phys. 32: 4521CrossRefGoogle Scholar
  4. 4.
    Hase T, Takahashi H, Izumi H, Ohata K, Suzuki K, Morishita T, Tanaka S (1991) J.Cryst.Growth 115: 788CrossRefGoogle Scholar
  5. 5.
    Hamet JF, Blanc-Guilhon B, Taffin A, Mercey B, Hervieu M, Raveau B (1993) Physica C 214: 55CrossRefGoogle Scholar
  6. 6.
    Mahajan S, Wen JG, Ito W, Cho CH, Takenaka T, Kubota N, Yoshida Y, Morishita T (1994) Physica C 225: 353CrossRefGoogle Scholar
  7. 7.
    Hontsu S, Mukai N, Ishii J, Kawai T, Kawai S, (1992) Appl.Phys.Lett. 61: 1134CrossRefGoogle Scholar
  8. 8.
    Mukaida M, and Miyazawa S, (1993) J.Appl.Phys. 74: 1209CrossRefGoogle Scholar
  9. 9.
    Kogachi M, Nakanishi S, Nakahigashi K, Minamigawa S, Sasakura H, Fukuoka N, and Yanase A, (1988) Jpn.J.Appl.Phys. 27: L1228CrossRefGoogle Scholar
  10. 10.
    Lopez-Morales ME, Rios-Jara D, Taguena J, Escuredo R, La Placa S, Bezinge A, Lee VY, Engler M, and Grant PM, (1988) Phys.Rev. B41: 6655CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Tokyo 1995

Authors and Affiliations

  • Toshihiko Nagano
    • 1
  • Tatsunori Hashimoto
    • 1
  • Jiro Yoshida
    • 1
  1. 1.Advanced Research LaboratoryToshiba R&D CenterSaiwai-ku, Kawasaki 210Japan

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