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Ultrafine AlGaAs/GaAs Quantum-Well Wire Fabrication by Combining Electron Beam Lithography and Two-Step Wet Chemical Etching

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Science and Technology of Mesoscopic Structures

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Summary

Ultrafine AlGaAs/GaAs quantum well wire structures as small as 35nm, with smooth sidewalls and low damage, which would otherwise be difficult to produce, e.g., by conventional dry etching, have been successfully fabricated by combining electron beam lithography and two-step wet chemical etching. Photoluminescence measurement has revealed that the thickness of the nonradiative “dead layer” of sidewalls formed during etching is remarkably reduced, even for the finest wires in the quantum regime (35nm), and the associated blue shift of emission due to the two-dimensional quantum confinement of the carriers has been clearly observed.

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Author information

Authors and Affiliations

  1. Department of Applied Physics, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113, Japan

    Eiichi Ishikawa & Kentaro Onabe

  2. Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153, Japan

    Susumu Fukatsu, Yasuhiro Shiraki & Ryoichi Ito

Authors
  1. Eiichi Ishikawa
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  2. Susumu Fukatsu
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  3. Kentaro Onabe
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  4. Yasuhiro Shiraki
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  5. Ryoichi Ito
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Editor information

Editors and Affiliations

  1. 536 Aba-machi, 851-01, Nagasaki, Japan

    Susumu Namba (Professor Emeritus of Osaka University, Professor of Nagasaki Institute of Applied Science) (Professor Emeritus of Osaka University, Professor of Nagasaki Institute of Applied Science)

  2. Department of Electronic Engineering, Osaka University, Yamadaoka 2-1, Suita City, Osaka, 565, Japan

    Chihiro Hamaguchi (Professor) (Professor)

  3. Institute for Solid State Physics, University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo, 106, Japan

    Tsuneya Ando (Professor) (Professor)

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© 1992 Springer Japan

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Ishikawa, E., Fukatsu, S., Onabe, K., Shiraki, Y., Ito, R. (1992). Ultrafine AlGaAs/GaAs Quantum-Well Wire Fabrication by Combining Electron Beam Lithography and Two-Step Wet Chemical Etching. In: Namba, S., Hamaguchi, C., Ando, T. (eds) Science and Technology of Mesoscopic Structures. Springer, Tokyo. https://doi.org/10.1007/978-4-431-66922-7_39

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  • DOI: https://doi.org/10.1007/978-4-431-66922-7_39

  • Publisher Name: Springer, Tokyo

  • Print ISBN: 978-4-431-66924-1

  • Online ISBN: 978-4-431-66922-7

  • eBook Packages: Springer Book Archive

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