Microwave Surface Resistance of YBa2Cu3Oy Thin Films Prepared by Inductive Coupled Plasma Sputtering
The YBa2Cu3Oy (YBCO) film having low surface resistance (R s ) was prepared using an inductive coupled plasma sputtering technique. To increase the low deposition rate, a new self-template method was examined. The YBCO films fabricated on the 21-nm-thick template YBCO layer were c-axis oriented grain perfectly and successfully grew even at 3 times higher deposition rate. However, the R s was not low enough, due to the in-plane misaligned grains. Therefore, the BaSnO3 (BSO) buffer was used to obtain perfect in-plane aligned grains. The R s value of the YBCO/YBCO-template/BSO/MgO film was 0.38 mΩ at 35 K and 1.13 mΩ at 77 K in measurement frequency 22 GHz. The R s values scaled to 10 GHz were 0.08 mΩ at 35 K and 0.23 mΩ at 77 K, respectively.
KeywordsDeposition Rate Inductive Couple Plasma YBCO Film YBCO Thin Film Template Layer
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