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Preparation and Growth Mechanism of YBCO Thin Film on Ag Substrate

  • M. Yamazaki
  • Y. Kudo
  • H. Yoshino
  • K. Ando
  • K. Inoue

Abstract

The preparation and the growth mechanism of YBCO thin films on a Ag substrate were investigated using two types of Physical Vapour Deposition methods. We found that higher Tc YBCO films were obtained on the Ag substrate using the ICB deposition method with a Cu-rich deposition condition because of the diffusion of Cu into the Ag substrate. We could reduce the amount of diffused Cu atoms, and obtain the higher Tc YBCO films (Tc=91.5K, Jc=2 × 104 A/cm2) using the laser ablation method under the condition of high repetition rate (50Hz). It has been clarified that the crystal orientation of YBCO films depends on the repetition rate.

Keywords

Pole Figure YBCO Film 50Hz Repetition Rate Ablation Condition YBCO Thin Film 
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Copyright information

© Springer Japan 1996

Authors and Affiliations

  • M. Yamazaki
    • 1
  • Y. Kudo
    • 1
  • H. Yoshino
    • 1
  • K. Ando
    • 1
  • K. Inoue
    • 2
  1. 1.Advanced Research LaboratoryToshiba CorporationSaiwai-ku, Kawasaki 210Japan
  2. 2.Super-GMOsaka 530Japan

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