Abstract
The preparation and the growth mechanism of YBCO thin films on a Ag substrate were investigated using two types of Physical Vapour Deposition methods. We found that higher Tc YBCO films were obtained on the Ag substrate using the ICB deposition method with a Cu-rich deposition condition because of the diffusion of Cu into the Ag substrate. We could reduce the amount of diffused Cu atoms, and obtain the higher Tc YBCO films (Tc=91.5K, Jc=2 × 104 A/cm2) using the laser ablation method under the condition of high repetition rate (50Hz). It has been clarified that the crystal orientation of YBCO films depends on the repetition rate.
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© 1996 Springer Japan
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Yamazaki, M., Kudo, Y., Yoshino, H., Ando, K., Inoue, K. (1996). Preparation and Growth Mechanism of YBCO Thin Film on Ag Substrate. In: Hayakawa, H., Enomoto, Y. (eds) Advances in Superconductivity VIII. Springer, Tokyo. https://doi.org/10.1007/978-4-431-66871-8_170
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DOI: https://doi.org/10.1007/978-4-431-66871-8_170
Publisher Name: Springer, Tokyo
Print ISBN: 978-4-431-66873-2
Online ISBN: 978-4-431-66871-8
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