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CAESAR: The Virtual IC Factory as an Integrated TCAD User Environment

  • V. Axelrad
  • Y. Granik
  • R. Jewell

Abstract

TMA’s Virtual IC Factory (CAESAR) is seen as a new enabling technology. CAESAR provides a higher level of user-system interaction than previously possible, especially effective in managing large-scale simulated experiments. CAESAR offers a hierarchic approach to specifying a simulation flow. Its open architecture design allows the utilization of heterogeneous simulators, standard or user-defined post-processing tools and extractors. CAESAR supports large-scale simulations by creating and managing intermediate simulation results. This includes automatic and transparent maintenance of data dependencies, incremental simulation support and visual access to simulation results via icons representing wafer data.

Rather than an incremental improvement over previously chosen approaches, CAESAR represents a qualitatively different complete environment to use TCAD with benefits for both the novice and the experienced so-called “power user”. The novice user benefits from the ease-of-use and encapsulation features of the system, allowing to conceal complex physics, numerics, simulator syntax and data interfacing details in pre-tested library modules. The experienced user can concentrate on the engineering goal of the simulation study and run large simulated splits without worrying about massive amounts of simulator input files, data files and complex dependencies between them.

Several major semiconductor companies have been involved in the specifications for CAESAR and its daily development. This assures the practical relevance of the tool, its robustness and suitability to fulfill real engineering needs.

Keywords

Control Parameter Simulation Flow Technology Modeling Dialog Window Module Editor 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Springer-Verlag/Wien 1993

Authors and Affiliations

  • V. Axelrad
    • 1
  • Y. Granik
    • 1
  • R. Jewell
    • 1
  1. 1.Technology Modeling AssociatesPalo AltoUSA

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