Technology CAD at NEC

  • N. Tanabe


An overview of the TCAD systems at NEC is presented on the types of problems encountered in the LSI technology developments and the electrical designs. Most of the simulation tools described here are ones that have been developed over the past 10 years and exclusively used in the actual LSI design cycles. The framework tools, that support the practical use of TCAD systems, are presented first. Then, focusing on our contribution to the related fields as well as on our industrial activity, the development and the use of process, device, circuit and interconnect simulations are presented. Some concerns that may enforce the TCAD regime are also discussed.


Error Indicator Circuit Simulation Device Simulation Dopant Diffusion IEDM Tech 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Springer-Verlag/Wien 1993

Authors and Affiliations

  • N. Tanabe
    • 1
  1. 1.ULSI Device Development LaboratoriesNEC CorporationSagamihara, Kanagawa 229Japan

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