The metal-oxide-semiconductor (MOS) structure is the heart of MOS technology. When this structure, commonly referred as MOS capacitor, is connected as a two terminal device, with one electrode connected to the metal and the other electrode connected to the semiconductor, a voltage dependent capacitance results. The MOS capacitor is a very useful device both for evaluating the MOS IC fabrication process and for predicting the MOS transistor characteristics. For this reason MOS capacitors are often included on the chip test sites. Note that the term MOS is still used even if the top electrode is not a metal and the insulator is not an oxide. Sometimes the acronym MIS (Metal-Insulator-Semiconductor) is also used for the MOS structure.
KeywordsGate Voltage Minority Carrier Inversion Layer Flat Band Interface Trap
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