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Ellipsometry in Microelectronic Technology

  • Karl Riedling

Abstract

Although the industrial use of ellipsometry is essentially limited to the analysis of insulating non-absorbing films, research applications of this technique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.

Keywords

Very Large Scale Integrate Doping Density Semiconductor Substrate Lattice Damage Microelectronic Technology 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag/Wien 1988

Authors and Affiliations

  • Karl Riedling
    • 1
  1. 1.Institut für Allgemeine Elektrotechnik und ElektronikTechnical University ViennaViennaAustria

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