Abstract
Although the industrial use of ellipsometry is essentially limited to the analysis of insulating non-absorbing films, research applications of this technique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.
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© 1988 Springer-Verlag/Wien
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Riedling, K. (1988). Ellipsometry in Microelectronic Technology. In: Ellipsometry for Industrial Applications. Springer, Vienna. https://doi.org/10.1007/978-3-7091-8961-0_2
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DOI: https://doi.org/10.1007/978-3-7091-8961-0_2
Publisher Name: Springer, Vienna
Print ISBN: 978-3-211-82040-7
Online ISBN: 978-3-7091-8961-0
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