Abstract
In practical application of surface and thin-film analysis, semi-quantitative determination of the elemental composition is often sufficient. However, due to increased employment of these surface-analytical methods in the development and characterization of valuable industrial products, there exists also an increasing demand for reliable quantitative surface and thin-film analysis.
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Bubert, H. (1985). Comparison of Ion Implantation Profiles Obtained by AES/Sputtering Measurements and Monte Carlo Calculations. In: Grasserbauer, M., Wegscheider, W. (eds) Progress in Materials Analysis. Mikrochimica Acta Supplementum, vol 11. Springer, Vienna. https://doi.org/10.1007/978-3-7091-8840-8_4
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DOI: https://doi.org/10.1007/978-3-7091-8840-8_4
Publisher Name: Springer, Vienna
Print ISBN: 978-3-211-81905-0
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