Comparison of Ion Implantation Profiles Obtained by AES/Sputtering Measurements and Monte Carlo Calculations

  • H. Bubert
Conference paper
Part of the Mikrochimica Acta Supplementum book series (MIKROCHIMICA, volume 11)


In practical application of surface and thin-film analysis, semi-quantitative determination of the elemental composition is often sufficient. However, due to increased employment of these surface-analytical methods in the development and characterization of valuable industrial products, there exists also an increasing demand for reliable quantitative surface and thin-film analysis.


Depth Profile Monte Carlo Calculation Target Atom Implantation Dose Silicon Target 
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Copyright information

© Springer-Verlag 1985

Authors and Affiliations

  • H. Bubert
    • 1
  1. 1.Institut für Spektrochemie und angewandte SpektroskopieDortmund 1Federal Republic of Germany

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