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Positron Studies of Defects in Metals and Semiconductors

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Progress in Materials Analysis

Part of the book series: Mikrochimica Acta Supplementum ((MIKROCHIMICA,volume 11))

Abstract

The study of defect properties in metallic and semiconducting material is important from the fundamental as well from the technological point of view. Positron annihilation is a method which is sensitive to defects on a microscopic and atomic scale. The method has its special potential in detecting vacancy-type defects. Positrons have found wide applications in studying defects in metals. Recently the positron method has also turned out to be a potential tool for defects in semiconductors. In this paper we present examples of applying positron annihilation in three different fields: (i) recovery and recrystallization of plastically deformed metals, (ii) decomposition phenomena in alloys, and (iii) vacancy-defects in compound semiconductors.

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© 1985 Springer-Verlag

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Brümmer, O., Dlubek, G. (1985). Positron Studies of Defects in Metals and Semiconductors. In: Grasserbauer, M., Wegscheider, W. (eds) Progress in Materials Analysis. Mikrochimica Acta Supplementum, vol 11. Springer, Vienna. https://doi.org/10.1007/978-3-7091-8840-8_15

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  • DOI: https://doi.org/10.1007/978-3-7091-8840-8_15

  • Publisher Name: Springer, Vienna

  • Print ISBN: 978-3-211-81905-0

  • Online ISBN: 978-3-7091-8840-8

  • eBook Packages: Springer Book Archive

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