Abstract
Silicon oxides arc used as isolating and passivating films in semiconductor devices and as protective and anti-reflection layers in optical systems. The electrical and optical parameters of such films and layers depend greatly on the chemical composition, i. e. the degree of oxidation.
Herrn Prof. Dr. Walter Koch zum 65. Geburtstag gewidmet und anläßlich des 7. Kolloquiums über metallkundliche Analyse mit besonderer Berücksichtigung der Elektronenstrahlmikroanalyse, Wien, 23.–25. 10. 1974 vorgetragen.
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
H. Leistner, J. Herberger, and W. Kosak, Kristall und Technik 7, 693 (1972).
E. I. Esmail, C. J. Nicholls, and D. S. Urch, Analyst 98, 725 (1973).
W. L. Baun and J. S. Solomon, Proc. 6th Nat. Conf. Electron Probe Analysis, Pittsbourgh 1971.
E. Wolfgang, Siemens Forsch.- u. Entwickl.-Ber. 3, 260 (1974).
D. S. Urch, J. Phys. C., Solid State Phys. 3, 1275 (1970).
Y. Takahashi, K. Yabe, T. Sato, and T. Takahashi, Proc. 6th Intern. Conf. X-Ray Optics and Microanalysis, ed. Shinoda et al., University of Tokyo Press, 1972, p. 553.
E. Ritter, Vakuum-Technik 21, 42 (1972).
J. W. Colby, Proc. 6th Intern. Conf. X-Ray Optics and Microanalysis, ed. Shinoda et al., University of Tokyo Press, 1972, p. 247.
E. W. White and R. Roy, Solid State Communications 2, 151 (1964).
W. Weisweiler, Quantitative Elektronenstrahl-Mikroanalyse leichter Elemente, Habil. Thesis, Univ. Karlsruhe 1972.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1975 Springer-Verlag Wien
About this paper
Cite this paper
Oppolzer, H., Wolfgang, E. (1975). A New Method of Electron-Probe Microanalysis for Determining the Degree of Oxidation in Silicon Oxides. In: Zacherl, M.K. (eds) Siebentes Kolloquium über metallkundliche Analyse mit besonderer Berücksichtigung der Elektronenstrahl-Mikroanalyse. Mikrochimica Acta, vol 6. Springer, Vienna. https://doi.org/10.1007/978-3-7091-8422-6_22
Download citation
DOI: https://doi.org/10.1007/978-3-7091-8422-6_22
Publisher Name: Springer, Vienna
Print ISBN: 978-3-211-81328-7
Online ISBN: 978-3-7091-8422-6
eBook Packages: Springer Book Archive