Recombination of Point Defects via Extended Defects and Its Influence on Dopant Diffusion

  • D. Stiebel
  • P. Pichler
Conference paper


The transient enhanced diffusion of dopants in silicon is known to be governed by the interaction of extended defects and intrinsic point defects. In this work we present calculations of the formation of extended defects and their interactions with point defects, based on ab-initio calculations of Gilmer, Caturla, and coworkers. Dissolution of the extended defects may occur either by diffusion of point defects to surfaces and interfaces, or by reactions in the bulk. The work presented here emphasizes especially the reaction of point defects with extended defects which is shown to be more effective than bulk recombination.


Point Defect Extended Defect Vacancy Cluster Intrinsic Point Defect Dopant Diffusion 


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Copyright information

© Springer-Verlag/Wien 1998

Authors and Affiliations

  • D. Stiebel
    • 1
  • P. Pichler
    • 1
  1. 1.BauelementetechnologieFraunhofer-Institut für Integrierte SchaltungenErlangenGermany

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