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Industrial Demands on Process and Device Simulation

  • A. v. Schwerin
  • A. Spitzer
Conference paper

Abstract

In this paper, we will give our view of the role of TCAD in the industrial technology development process, as well as of the division of labor between industrial TCAD, vendors of commercial TCAD software, and academia. Furthermore a list of model shortcomings is presented that — we feel still — prevent broad productive use of TCAD in industrial technology development. In the end we will define our primary demands for future development work on process and device simulation by vendors and institutes and our vision of the role of TCAD frameworks.

Keywords

Monte Carlo Chemical Mechanical Polishing Device Simulation Dynamic Random Access Memory Dislocation Formation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag/Wien 1998

Authors and Affiliations

  • A. v. Schwerin
    • 1
  • A. Spitzer
    • 2
  1. 1.Semiconductor GroupSiemens AGMunichGermany
  2. 2.Corporate ResearchSiemens AGMunichGermany

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