Advertisement

Correlation of Finite Element Stress Simulations with Electromigration-Induced Fractures in Tungsten Plug Structures

  • S. Chaudhry
  • P. A. Layman
  • J. S. Huang
  • A. S. Oates
  • S. M. Merchant
  • J. Q. Zhao
Conference paper

Abstract

Finite element stress simulations are used to explain the origin of cracks and the related increase in via resistance in tungsten plug structures. The simulations suggest that stress evolution during electromigration induced depletion can explain this new failure mechanism in interconnect structures using tungsten plugs.

Keywords

Anti Reflection Coating Lucent Technology Finite Element Stress Wafer Curvature Thermal Mismatch Stress 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    T. Kwok, C. Tan, D. Moy J.J. Estabil, H.S. Rathore, and S. Basavaiah, Proceedings of VLSI Multi-level Interconnect Conference, (1990), p. 106.CrossRefGoogle Scholar
  2. [2]
    S. Domae, H. Masuda, K. Tateiwa, Y. Kato, and M. Fujimoto, The 36th Annual Proceeding of the IEEE Reliability Physics Symposium (Reno, NA, IEEE, 1998 ), p. 318.Google Scholar
  3. [3]
    L.J. Elliott, T. Spooner, J.H. Rose, and R. Shuman, Mater. Res. Symp. Proc. 391, (San Fransisco, CA, Material Research Society, 1995 ), p. 459.Google Scholar
  4. [4]
    J.A. Walls, IEEE Trans. Electron Dev. Lett., 16, 430 (1995).CrossRefGoogle Scholar
  5. [5]
    J.S. Huang et al., Lucent Technologies, Orlando, FL, unpublished.Google Scholar
  6. [6]
    Mark E. Law, FLOOPS manual.Google Scholar
  7. [7]
    Medici user’s manual, Vol. 3, TMA, Feb. 1997.Google Scholar

Copyright information

© Springer-Verlag/Wien 1998

Authors and Affiliations

  • S. Chaudhry
    • 1
  • P. A. Layman
    • 1
  • J. S. Huang
    • 1
  • A. S. Oates
    • 1
  • S. M. Merchant
    • 1
  • J. Q. Zhao
    • 1
  1. 1.Bell LaboratoriesLucent TechnologiesOrlandoUSA

Personalised recommendations