Integration of Lithography and Etch Simulations

  • Z. Krivokapic
  • W. D. Heavlin
  • D. S. Bang
Conference paper


In this work we report on predictions of final gate critical dimensions using lithography and plasma etch simulators integrated with a statistical simulator


Reactor Power Exposure Dose Latin Hypercube Design Reactor Simulation Plasma Nonuniformity 
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Copyright information

© Springer-Verlag/Wien 1998

Authors and Affiliations

  • Z. Krivokapic
    • 1
  • W. D. Heavlin
    • 1
  • D. S. Bang
    • 1
  1. 1.Advanced Micro DevicesSunnyvaleUSA

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