A Powerful TCAD System Including Advanced RSM Techniques for Various Engineering Optimization Problems
This paper presents the NORMAN/DEBORA TCAD system developed at IMEC to design and optimize sub-micron IC technology using process and device simulators. The versatility of the TCAD system will be shown for two important problems encountered in IC technology design and optimization.
KeywordsResponse Surface Methodology Threshold Voltage Process Sensitivity Vacancy State Target Deviation
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