Predicting Manufacturing Variabilities for Deep Submicron Technologies: Integration of Process, Device, and Statistical Simulations
Process and device simulators are used to project the long term manufacturing distributions of 0.35 µm, planarized, concave transistors. Particular care is taken to calibrate the simulators, and to quantify the contribution from each manufacturing source of variation.
KeywordsNoise Factor Channel Region Device Simulator Calibration Approach Latin Hypercube Design
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