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Predicting Manufacturing Variabilities for Deep Submicron Technologies: Integration of Process, Device, and Statistical Simulations

  • Z. Krivokapic
  • W. D. Heavlin

Abstract

Process and device simulators are used to project the long term manufacturing distributions of 0.35 µm, planarized, concave transistors. Particular care is taken to calibrate the simulators, and to quantify the contribution from each manufacturing source of variation.

Keywords

Noise Factor Channel Region Device Simulator Calibration Approach Latin Hypercube Design 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Springer-Verlag Wien 1993

Authors and Affiliations

  • Z. Krivokapic
    • 1
  • W. D. Heavlin
    • 1
  1. 1.Advanced Micro DeviceSunnyvaleUSA

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