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Challenges to Achieving Accurate Three-Dimensional Process Simulation

  • M. E. Law

Abstract

This paper will identify the reasons three-dimensional process simulators are not widely available, when three-dimensional device simulators are widely available. There appear to be four major obstacles; metrology, models, numerics, and structural barriers. Each of these will be discussed and possible solutions will be provided.

Keywords

Device Simulation Fabrication Facility Diffusion Simulation Dopant Diffusion International Electron Device Meet 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Wien 1993

Authors and Affiliations

  • M. E. Law
    • 1
  1. 1.Florida Integrated Research in Silicon Technology, Department of Electrical EngineeringUniversity of FloridaGainsvilleUSA

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