T2CAD: Total Design for Sub-um Process and Device Optimization with Technology-CAD

  • Hiroo Masuda


“T2CAD (Total-Technology-CAD)” is proposed as an application technology of process & device simulators, which provides useful and important data for VLSI process design and optimization. It includes (1) reliability & accuracy of TCAD simulations and (2) process and device optimization method with TCAD, as well as (3) application methodology to VLSI chip design. A sub-um CMOS technology for Mega-bit DRAMs has been optimized based on T2CAD.


Drain Current Dynamic Random Access Memory Total Design Device Optimization Gate Oxide Thickness 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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  1. [1]
    H. Masuda et al.; ‘TCAD strategy for predictive VLSI memory development’, Technical Digest of IEDM’94, pp. 153–156, Dec. 1994.Google Scholar
  2. [2]
    H. Sato, K. Tsuneno and H. Masuda; ‘Evaluation of two-dimensional transient enhanced diffusion of Phosphorous during shallow junction formation,’ IEICE Trans. Electron., Vol. E-77-C, No. 2, pp. 106–111, Feb. 1994.Google Scholar
  3. [3]
    K. Tsuneno, H. Sato and H. Masuda; ‘Modeling and simulation of anomalous degradation of submicron NMOS’s current-driving due to velocity-saturation effect,’ IEICE Trans. Electron., Vol. E-77-C, No. 2, pp. 161–165, Feb. 1994.Google Scholar
  4. [4]
    G. E. P. Box and N. R. Draper; ‘Empirical model building and response surface, John Wiley and Sons, 1987.Google Scholar
  5. [5]
    H. Masuda, F. Otsuka, Y. Aoki, and S. Satoh, S. Shimada; ‘Response surface method for submicron MOSFETs characterization with variable transformation technology,’ IEICE Trans., E-74, Vol. 6, pp.1621–1633, June 1991.Google Scholar
  6. [6]
    H. Sato et al.; ‘A new hierarchical RSM for TCAD-based device design to predict CMOS development’, Technical Digest of ICMTS’95, pp. 299–302, March 1995.Google Scholar

Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • Hiroo Masuda
    • 1
  1. 1.Hitachi, Ltd.Ome-shi, TokyoJapan

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