An Improved Calibration Methodology for Modeling Advanced Isolation Technologies
An improved calibration methodology for simulating advanced isolation technologies using SUPREM-IV is presented. Based on the experimental determination of the material properties of silicon nitride, an improved parameter set for the stress dependent oxidation models is derived. The calculated substrate stress using this new parameter set is compared with micro-raman spectroscopy stress measurements to validate the calibration methodology.
KeywordsSilicon Nitride Boundary Shape Silicon Nitride Film Calibration Methodology Isolation Structure
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