2-D Adaptive Simulation of Dopant Implantation and Diffusion

  • Chih-Chuan Lin
  • Mark E. Law
Conference paper


This paper describes the techniques for adaptive grid generation for dopant implantation and diffusion in process simulation.


Posteriori Error Posteriori Error Estimation Adaptive Grid Junction Depth Local Refinement 
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    R. E. Bank, “Moving Mesh, ”NSF/SEMATECH Workshop on Gridding in VLSI TCAD, section V, Mar. 1994.Google Scholar

Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • Chih-Chuan Lin
    • 1
  • Mark E. Law
    • 1
  1. 1.Department of Electrical EngineeringUniversity of FloridaGainesvilleUSA

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