Advertisement

An Exponentially Fitted Finite Element Scheme for Diffusion Process Simulation on Coarse Grids

  • S. Mijalković
Conference paper

Abstract

A new finite element scheme for diffusion process simulation, which allows coarse grid spacings in the areas of exponentially varying concentrations and fluxes, is proposed. It employs a nonlinear test function obtained from local divergence free conditions. Two-dimensional test computations show clear superiority of the exponentially fitted finite element scheme over the standard approach, as well as its robustness regarding irregular grid geometry.

Keywords

Diffusion Equation Grid Structure Discrete Solution Junction Depth Finite Element Scheme 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    R. E. Lowther, “A discretization scheme that allows coarse grid-spacings in finite-difference process simulation, ”IEEE Trans. Computer-Aided Design, vol. 8, pp. 837–841, Aug. 1989.CrossRefGoogle Scholar
  2. [2]
    I. Babuska and J. E. Osborn, “Generalized finite element methods: their performance and their relation to mixed methods, ”SIAM J. Numer. Anal., vol. 20, No. 3, pp. 510–536, June 1983.MathSciNetMATHCrossRefGoogle Scholar
  3. [3]
    H. Lee, R. Dutton and D. Antoniadis, “On redistribution of boron during thermal oxidation in silicon, ”J. Electrochem. Soc., vol. 126, pp. 2001–2007, 1979.CrossRefGoogle Scholar
  4. [4]
    R. Ismail and G. Amaratunga, “Adaptive meshing schemes for simulating doping diffusion, ”IEEE Trans. Computer-Aided Design, vol. 9, pp. 276–289, March 1990.CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • S. Mijalković
    • 1
  1. 1.Faculty of Electronic EngineeringUniversity of NišNišYugoslavia

Personalised recommendations