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Modeling the Wafer Temperature in a LPCVD Furnace

  • A. Kersch
  • M. Schäfer
Conference paper

Abstract

In the paper the application of a newly developed radiation model to the modeling of a batch furnace is shown. The model includes multi-band spectral dependence and the treatment of semitransparent materials The results are compared with experimental data.

Keywords

Black Body Radiation Radiation Model Wafer Temperature Semitransparent Material Batch Furnace 
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References

  1. [1]
    H. De Waardt and W. L. De Koning, Automatica, vol.28, p.243, 1982CrossRefGoogle Scholar
  2. [2]
    T. A. Badgwell, I. Trachtenberg and T. F. Edgar, “Modeling the Wafer Temperature Profile in a Multiwafer LPCVD Furnace”, J. Electrochem. Soc., vol 141, p.161, 1994CrossRefGoogle Scholar
  3. [3]
    PHOENICS-CVD, CHAM, Wimbledon, 1995Google Scholar

Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • A. Kersch
    • 1
  • M. Schäfer
    • 2
  1. 1.Corporate Research and DevelopmentSIEMENS AGMunichGermany
  2. 2.Fraunhofer-Institut für Integrierte SchaltungenErlangenGermany

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