Modeling the Wafer Temperature in a LPCVD Furnace
In the paper the application of a newly developed radiation model to the modeling of a batch furnace is shown. The model includes multi-band spectral dependence and the treatment of semitransparent materials The results are compared with experimental data.
KeywordsBlack Body Radiation Radiation Model Wafer Temperature Semitransparent Material Batch Furnace
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- PHOENICS-CVD, CHAM, Wimbledon, 1995Google Scholar