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Numerical and analytical modelling of head resistances of diffused resistors

  • U. Witkowski
  • D. Schroeder
Conference paper

Abstract

Head resistances of diffused resistors are investigated by means of numerical device simulation. Outgoing from an understanding of the current flow pattern, an analytical model for the calculation of the head resistance from known geometric and technological parameters is developed. The results of the simulations and the modelling are verified by comparison with experimental data.

Keywords

Contact Resistance Semiconductor Device Diffuse Resistor Specific Contact Resistance Spreading Resistance 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • U. Witkowski
    • 1
  • D. Schroeder
    • 1
  1. 1.TU Hamburg-HarburgTechn. ElectronicsHamburgGermany

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