Effect of Process-Induced Mechanical Stress on Circuit Layout

  • Hideo Miura
  • Yasunobu Tanizaki


The effect of process-induced mechanical stress on characteristics of a simple differential amplifier circuit are analyzed using the finite element method, based on the piezoresistance effect of diffused resistors and the experimentally determined sensitivities of transistor characteristics to stress. The predicted change distribution of the resistivity of p-type diffused resistors and of the hfe and Vbe of pnp transistors agree well with the measured data.


Passivation Film Resistivity Change Diffuse Resistor Stress Simulation Piezoresistance Effect 
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Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • Hideo Miura
    • 1
  • Yasunobu Tanizaki
    • 2
  1. 1.Mechanical Engineering Research LaboratoryHitachi, Ltd.Tsuchiura, IbarakiJapan
  2. 2.Semiconductor & Integrated Circuits Div.Hitachi, Ltd.Kodaira, TokyoJapan

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