Abstract
This paper describes titanium silicidation modeling using the process simulator FLOOPS. Erpimental work shows that viscoelastic models are required to fit the observed behavior. The capability to simulate a wide range of silicide examples are shown, but more experimental evidence is needed to calibrate the models.
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© 1995 Springer-Verlag Wien
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Cea, S., Law, M. (1995). Viscoelastic Modeling of Titanium Silicidation. In: Ryssel, H., Pichler, P. (eds) Simulation of Semiconductor Devices and Processes. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6619-2_31
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DOI: https://doi.org/10.1007/978-3-7091-6619-2_31
Publisher Name: Springer, Vienna
Print ISBN: 978-3-7091-7363-3
Online ISBN: 978-3-7091-6619-2
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