Advertisement

Efficient and Rigorous 3D Model for Optical Lithography Simulation

  • Kevin D. Lucas
  • Hiroyoshi Tanabe
  • Chi-Min Yuan
  • Andrzej J. Strojwas

Abstract

A new workstation-based rigorous model for 3D vector lithography simulation is introduced. The model extends a successful 2D lithography model, and has been applied to the simulation of 3D photomasks. The theory behind the new model is presented, and examples are given of the model’s results and computational efficiency. The procedures for extending the model to the simulation of 3D optical alignment, metrology and photoresist bleaching problems are also given.

Keywords

Aerial Image Gauge Freedom Optical Alignment Light Scattering Effect Waveguide Method 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    C. M. Yuan, A. J. Strojwas. Proc. of SPIE Microlithography Vol. 1264, 1990.Google Scholar
  2. [2]
    K. D. Lucas, C. M. Yuan, A. J. Strojwas. SISDEP IV 1991.Google Scholar
  3. [3]
    K. D. Lucas, A. J. Strojwas. Proc. of SPIE Microlithography Vol. 1809, 1992.Google Scholar
  4. [4]
    H. Tanabe. Proc. of SPIE Microlithography Vol. 1674, 1992.Google Scholar
  5. [5]
    K. K. H. Toh, A. R. Neureuther. Proc. of SPIE Microlithography Vol. 1463, 1991.Google Scholar
  6. [6]
    K. D. Lucas, H. Tanabe, A. J. Strojwas. Proc. of SPIE Microlithography Vol. 2440, 1995.Google Scholar

Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • Kevin D. Lucas
    • 1
    • 3
  • Hiroyoshi Tanabe
    • 2
  • Chi-Min Yuan
    • 1
  • Andrzej J. Strojwas
    • 3
  1. 1.Advanced Products Research & Development LabMotorola Inc.AustinUSA
  2. 2.Opto-Electronics Research LabNEC CorporationKawasaki, KanagawaJapan
  3. 3.Electrical & Computer Engin. Dept.Carnegie Mellon Univ.PittsburghUSA

Personalised recommendations