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Fast and Accurate Aerial Imaging Simulation for Layout Printability Optimization

  • V. Axelrad
Conference paper

Abstract

Optical lithography has been a major force in the continuing reduction of feature size in VLSI. Pushing the limits of lithography by using advanced lenses (high NA, in-lens filtering, etc.), light sources (annular, etc.) and mask designs (phase shift masks, optical proximity corrections, etc.) allowed to extend its life span far beyond what was predicted only 10 years ago.

Keywords

Aerial Image Fast Fourier Transform Algorithm Mask Image Optical Lithography Regular Layout 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • V. Axelrad
    • 1
  1. 1.Technology Modeling AssociatesPalo AltoUSA

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