Fast and Accurate Aerial Imaging Simulation for Layout Printability Optimization
Optical lithography has been a major force in the continuing reduction of feature size in VLSI. Pushing the limits of lithography by using advanced lenses (high NA, in-lens filtering, etc.), light sources (annular, etc.) and mask designs (phase shift masks, optical proximity corrections, etc.) allowed to extend its life span far beyond what was predicted only 10 years ago.
KeywordsAerial Image Fast Fourier Transform Algorithm Mask Image Optical Lithography Regular Layout
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