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TCAD Optimization Based on Task-Level Framework Services

  • Ch. Pichler
  • N. Khalil
  • G. Schrom
  • S. Selberherr

Abstract

This paper presents the integration of an external optimizer into the VISTA TCAD framework. A collection of task-level framework services is used by the optimizer to request the execution of process flow and device simulation tasks. All aspects of tool control and simulation data management are taken care of by these services, allowing for an easy implementation of a variety of task-level applications such as sensitivity analysis tasks, optimization, and RSM extraction. An example shows the calibration of MINIMOS’ mobility parameters.

Keywords

Process Flow Response Surface Model Gate Length Optimization Task Service Layer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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    S. Halama et al., The Viennese Integrated System for Technology CAD Applications, Technology CAD Systems, 197–236, Springer 1993.Google Scholar
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    N. Khalil, J. Faricelli, D. Bell, and S. Selberherr, The Extraction of Two-Dimensional MOS Transistor Doping via Inverse Modeling, IEEE Electron. Dev. Lett., 16:17–19, 1995.CrossRefGoogle Scholar
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    Ch. Pichler and S. Selberherr, Process Flow Representation within the VISTA Framework, SISDEP V, 25–28, 1993.Google Scholar
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    S. Selberherr, W. Hänsch, M. Seavey, and J. Slotboom, The Evolution of the MINIMOS Mobility Model”, Solid-State Electron., 33(11):1425–1436, 1990.CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Wien 1995

Authors and Affiliations

  • Ch. Pichler
    • 1
  • N. Khalil
    • 2
  • G. Schrom
    • 1
  • S. Selberherr
    • 1
  1. 1.Institute for MicroelectronicsTU ViennaViennaAustria
  2. 2.Digital Equipment CorporationHudsonUSA

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