Modelling of silicon interstitial surface recombination velocity at non-oxidizing interfaces
In this work we present a model for the surface recombination velocity of silicon interstitials at non oxidizing interfaces. The model takes in to account the experimentally observed diffusion of silicon atoms through an oxide. The influence of the interfacial region in also discussed.
KeywordsInterfacial Layer Interfacial Region Silicon Atom Silicon Membrane Surface Recombination Velocity
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