Abstract
In 1934 Zener [3.118] proposed band-to-band tunneling as explanation for the electrical breakdown. A modified Zener theory was used by McAffee et al. [3.75] in 1951 to describe the breakdown of reversed biased pn-junctions, called Zener diodes since then. However, experimental work [3.76–3.78] in the following years showed that in such diodes with wide junctions the breakdown is not caused by tunneling, but by impact ionization. Only in narrow junctions, where the width of the transition region is less than 50 nm, the necessary field strength for tunneling is reached before the avalanche effect sets in. This was first clearly demonstrated by Chynoweth and McKay [3.22] in 1957 by the absence of microplasma noise and by the temperature coefficients of reverse and forward characteristics of junctions with different breakdown voltages. In the same year Esaki [3.32] discovered that narrow pn-junctions between degenerate regions can have forward characteristics with a portion of negative differential conductivity, and that the tunnel “hump” is only weakly temperature dependent. Esaki’s work initiated intensive experimental and theoretical investigations. Holonyak et al. [3.53] and Hall [3.45] observed structures in the I (V)-characteristics of heavily doped Si-junctions at 4.2 K, which they attributed to the momentum-conserving phonons in indirect band-to-band tunneling. Various phonon energies could be resolved in these characteristics. Chynoweth et al. [3.19, 3.20] then found evidence that the excess current in silicon Esaki junctions, i.e. the current between the tunnel “hump” and the normal forward injection current, is essentially caused by the process of field ionization of impurity levels.
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Schenk, A. (1998). Advanced Generation-Recombination Models. In: Advanced Physical Models for Silicon Device Simulation. Computational Microelectronics. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6494-5_3
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