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Manufacturing Methods and Material Systems

  • Christoph Wasshuber
Part of the Computational Microelectronics book series (COMPUTATIONAL)

Abstract

So far we have looked at the physics of single-electronics, at possible applications, and at methods to analyze them. What is missing is how to fabricate them. This final piece is a very important one, if not the most important one, for a successful single-electron technology. It means that most likely new and uncommon materials will have to be introduced and new processes have to be made reliable, reproducible, and economical. The following gives an overview of fabrication methods and material systems for single-electron devices. At this point no single method can be said to be ready for mass fabrication or can be considered superior to any other method. A compatibility with CMOS processes is desirable to allow mixing of CMOS and single-electronics.

Keywords

Tunnel Junction Tunnel Resistance Optical Lithography Granular Film Lower Barrier Height 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Wien 2001

Authors and Affiliations

  • Christoph Wasshuber
    • 1
  1. 1.Texas InstrumentsDallasTexasUSA

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