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Atomistic Front-End Process Modelling: A Powerful Tool for Deep-Submicron Device Fabrication

  • M. Jaraiz
  • P. Castrillo
  • R. Pinacho
  • I. Martin-Bragado
  • J. Barbolla

Abstract

The complexity attained by current microelectronics process technology can hardly be handled with simulators based on the continuum approach. Over the last few years, atomistic Kinetic Monte Carlo has proven to be a new way to tackle the problems that arise as device dimension shrink into the deep submicron regime. We present some encouraging results of exploring the capabilities of this new process modelling approach.

Keywords

Point Defect Dislocation Loop Extended Defect Kinetic Monte Carlo Versus Profile 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Wien 2001

Authors and Affiliations

  • M. Jaraiz
  • P. Castrillo
    • 1
  • R. Pinacho
    • 1
  • I. Martin-Bragado
    • 1
  • J. Barbolla
    • 1
  1. 1.Dept. de ElectronicaUniv. de ValladolidSpain

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