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A Simple Modeling and Simulation of Complete Suppression of Boron Out-Diffusion in Si1-xGex by Carbon Insertion

  • K. Rajendran
  • W. Schoenmaker
Conference paper

Abstract

We present a simple modeling of boron diffusion in Sii_X_yGe„Cy by manipulating the strain and the intrinsic carrier concentration. We show that the diffusion of boron is strongly suppressed by a moderate concentration of substitutional C in Sii_XGex. This suppression is due to an under saturation of Si selfinterstitials in the C-rich region. The results obtained from the proposed model are in good agreement with the measured values.

Keywords

SiGe Layer Heterojunction Bipolar Transistor Boron Diffusivity Substitutional Carbon Intrinsic Carrier Concentration 
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References

  1. [1]
    Osten, HJ, Lippert G, Knoll D, Barth R, Heinemann B, Rucker H, and Schley P (1997):The effect of carbon incorporation on SiGe heterobipolar transistor performance and process margin. Tech. Dig. IEDM, pp. 803–06.Google Scholar
  2. [2]
    Nishikawa, S., Takeda, A., and Yamaji, T (1992): Reduction of transient boron diffusion in preamorphized Si by carbon implantation. Appl. Phys. Left. 60: 2270–72CrossRefGoogle Scholar
  3. [3]
    Lever RF, Bonar JM, and Willoughby AFW (1998): Boron diffusion across silicon-silicon germanium boundaries. J. Appl. Phys. 83: 1998–04CrossRefGoogle Scholar
  4. [4]
    Rajendran K and Schoenmaker W (2001): Studies of boron diffusivity in strained SiGe epitaxial layers. J. Appl. Phys. 89: 980–86CrossRefGoogle Scholar
  5. [5]
    Rucker H, Heinemann B, Bolze D, Kurps R, Kruger D, Lippert G, Osten HJ (1999): The impact of supersaturated carbon on transient enhanced diffusion. Appl. Phys. Lett.74: 1682–4.CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Wien 2001

Authors and Affiliations

  • K. Rajendran
    • 1
  • W. Schoenmaker
    • 1
  1. 1.STDI/TCAD DivisionIMECLeuvenBelgium

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