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Sputtering Experiments with the Amsterdam Electromagnetic Isotope Separator

  • P. K. Rol
  • J. M. Fluit
  • J. Kistemaker
Conference paper

Summary

The sputtering ratio of polycrystalline copper is measured by bombarding with ions of many elements as a function of the ion energy and the angle of incidence. For copper monocrystals the sputtering ratio has been measured for different crystal orientations as a function of the angle of incidence in bombardment with Ar+-ions at 20 keV. An interpretation of the measurements is given on the basis of rigid sphere collisions of the ions in the lattice. It is supposed that excited regions, which emit the sputtered particles, are formed near the surface.

Keywords

Angular Distribution Free Path Target Material Oblique Incidence Target Atom 
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References

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Copyright information

© Springer-Verlag in Vienna 1961

Authors and Affiliations

  • P. K. Rol
    • 1
  • J. M. Fluit
    • 1
  • J. Kistemaker
    • 1
  1. 1.F.O.M.-Laboratorium voor MassaspectrografieAmsterdamThe Netherlands

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