Quantitative Secondary Neutral Mass Spectrometry Analysis of Alloys and Oxide-Metal-Interfaces

  • K. H. Müller
  • H. Oechsner
Part of the Mikrochimica Acta book series (MIKROCHIMICA, volume 10)


For the chemical analysis of a solid sample a number of physical methods have been developed besides the classical, mostly time consuming methods of wet chemistry. Such analytical techniques are e.g. the optical emission and absorption spectroscopy or X-ray fluorescence, but also more recent techniques as X-ray Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES), Secondary Ion Mass Spectroscopy (SIMS), Ion Scattering Spectroscopy (ISS) and others. This second group of analytical methods is of particular interest because of the possibility to determine the chemical composition at the very surface of the sample, and to obtain concentration depth profiles when the sample material is removed by sputtering.


Depth Profile Auger Electron Spectroscopy Relative Sensitivity Factor Sputter Depth Profile Atomic Sputtering 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    H. Oechsner, Appl. Phys. 8, 185 (1975).CrossRefGoogle Scholar
  2. 2.
    H. Oechsner and W. Gerhard, Phys. Letters 40A, 211 (1972).Google Scholar
  3. 3.
    H. Oechsner, Plasma Physics 16, 835 (1974).CrossRefGoogle Scholar
  4. 4.
    H. Oechsner, W. Rühe, and E. Stumpe, Surf. Sci. 85, 289 (1979).CrossRefGoogle Scholar
  5. 5.
    H. Oechsner and A. Wucher, Appl. Surf. Sci. 10, 342 (1982).CrossRefGoogle Scholar
  6. 6.
    H. Oechsner and E. Stumpe, Appl. Phys. 14, 43 (1977).CrossRefGoogle Scholar
  7. 7.
    E. Stumpe, H. Oechsner, and H. Schoof, Appl. Phys. 20, 55 (1979).CrossRefGoogle Scholar
  8. 8.
    H. Oechsner, H. Schoof, and E. Stumpe, Surf. Sci. 76, 343 (1978).CrossRefGoogle Scholar
  9. 9.
    H. Oechsner, Molecule Formation in Oxide Sputtering. In: Secondary Ion Mass Spectrometry SIMS III, A. Benninghoven et al. (eds.). Berlin-Heidelberg-New York: Springer-Verlag. 1982. p. 106.CrossRefGoogle Scholar
  10. 10.
    H. Schoof and H. Oechsner, Proc. 4th ICSS Cannes 1980, Vol. II, p. 1291 (Suppl. 201 of LeVide, le Conches Minces).Google Scholar

Copyright information

© Springer-Verlag Wien 1983

Authors and Affiliations

  • K. H. Müller
    • 1
  • H. Oechsner
    • 1
    • 2
  1. 1.Fachbereich PhysikUniversität KaiserslauternKaiserslauternFederal Republic of Germany
  2. 2.Fachbereich PhysikUniversität Kaiserslautern, Technische PhysikKaiserslauternFederal Republic of Germany

Personalised recommendations