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Silicon Micromachining

  • M. Elwenspoek
  • R. Wiegerink
Part of the International Centre for Mechanical Sciences book series (CISM, volume 429)

Abstract

The arsenal of technologies for silicon micromachining comprise photolithography. thin film deposition. doping, etching by wet chemicals and plasmas and waferbonding. Mainly for the sake of clarity and to describe the notions necessary to understand the limits and possibilities of micromachining we give a brief account of these fabrication methods.

Keywords

Silicon Nitride Etch Rate Plasma Etching Electro Mechanical System Anodic Bonding 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Wien 2001

Authors and Affiliations

  • M. Elwenspoek
    • 1
  • R. Wiegerink
    • 1
  1. 1.Faculteit der ElektrotechniekUniversity of TwenteEnschedeThe Netherlands

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