The arsenal of technologies for silicon micromachining comprise photolithography. thin film deposition. doping, etching by wet chemicals and plasmas and waferbonding. Mainly for the sake of clarity and to describe the notions necessary to understand the limits and possibilities of micromachining we give a brief account of these fabrication methods.
KeywordsSilicon Nitride Etch Rate Plasma Etching Electro Mechanical System Anodic Bonding
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