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Atomic Layer Deposition for Nanotechnology

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Abstract

Atomic layer deposition (ALD) is a thin film chemical vapor deposition technology that is uniquely able to deliver extremely conformal, pin hole free, nanometer thick films. It is finding a large number of applications in nanotechnology such as display technology, integrated circuit (IC) fabrication, solar cells and catalysis. In this chapter we will discuss the background behind ALD, its fundamentals, and some of the nanotechnology applications, deposition in nanotubes, deposition of nanoparticles, and deposition of nanometer thick films.

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Author information

Authors and Affiliations

  1. Department of Chemical and Materials Engineering, University of Alberta, Edmonton, AB, Canada

    A. Foroughi-Abari & K. Cadien

Authors
  1. A. Foroughi-Abari
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  2. K. Cadien
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Correspondence to K. Cadien .

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Editors and Affiliations

  1. , National Research Council of Canada, National Institute for Nanotechnology, Saskatchewan Drive 1142, Edmonton, T6G 2M9, Alberta, Canada

    Maria Stepanova

  2. , Electrical and Computer Engineering, University of Alberta, Edmonton, T6G 2V4, Alberta, Canada

    Steven Dew

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© 2012 Springer-Verlag/Wien

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Foroughi-Abari, A., Cadien, K. (2012). Atomic Layer Deposition for Nanotechnology. In: Stepanova, M., Dew, S. (eds) Nanofabrication. Springer, Vienna. https://doi.org/10.1007/978-3-7091-0424-8_6

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