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Directions in Nanofabrication

  • Steven K. DewEmail author
  • Maria Stepanova
Chapter

Abstract

Nanotechnology is dependent on nanofabrication techniques to structure matter at the 1–100 nm lengthscale. In this book, a variety of nanofabrication techniques are described, including those for lithography using electron and helium ion beams or nanoimprint lithography; for deposition using atomic layer deposition, surface monolayer formation, block copolymers, or electroepitaxy; and for etching using chemical mechanical polishing, ion beam induced reactions, laser nanopatterning, or anodic oxide templating. In each case, principles, methodology, equipment and process parameters are described, along with capabilities and example applications. Taken together, these represent a powerful toolbox of the rapidly evolving pool of nanofabrication techniques.

Keywords

Atomic Layer Deposition Chemical Mechanical Polishing Electron Beam Lithography Nanoimprint Lithography Nanofabrication Technique 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgements

The authors are grateful for the support of the Natural Sciences and Engineering Research Council of Canada, the National Institute for Nanotechnology, and the University of Alberta NanoFab. As editors, we are also grateful for the hard work, vast expertise and professional manner of the contributing authors who have taken time out of their very busy schedules to write an excellent set of chapters on a fascinating topic.

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Copyright information

© Springer-Verlag/Wien 2012

Authors and Affiliations

  1. 1.Department of Electrical and Computer EngineeringUniversity of AlbertaEdmontonCanada
  2. 2.National Institute for Nanotechnology, National Research Council, and Department of Electrical and Computer EngineeringUniversity of AlbertaEdmontonCanada

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