Abstract
After a brief description of the theoretical principles of multilayer mirrors, we present the state of the art of experimental results obtained in the XUV range. We then focus on the specificities of multilayer mirrors for pico- and femtosecond sources, in terms of reflectivity, selectivity and stability. Finally, we report the recent advances in the development of multilayer mirrors for attosecond sources, from the design of the mirror to the characterization of such a component.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
E. Spiller, Appl. Phys. Lett. 20, 365 (1972)
D.T. Attwood (ed.), Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, Cambridge, 2000)
D.L. Windt, Comput. Phys. 12, 360 (1998)
B. Pardo, T. Megademini, J.M. André, Rev. Phys. Appl. 23, 1579 (1988)
M. Yamamoto, T. Namioka, Appl. Opt. 31, 1622 (1992)
L. Nevot, P. Croce, Rev. Phys. Appl. 15, 761 (1980)
L. Nevot, B. Pardo, J. Corno, Rev. Phys. Appl. 23, 1675 (1988)
F. Bridou, B.A. Pardo, J. Opt. 21, 183 (1990)
E.M. Gullikson, J.H. Underwood, P.C. Batson, V. Nikitin, J. X-ray Sci. Technol. 3, 283 (1992)
S. Döring, F. Hertlein, A. Bayer, K. Mann, Appl. Phys. A 107, 795 (2012)
D.L. Windt, S. Donguy, C.J. Hailey, J. Koglin, V. Honkimaki et al., Appl. Opt. 42, 2415 (2003)
H. Maury, F. Bridou, P. Troussel, E. Meltchakov, F. Delmotte, Nucl. Instr. Meth. Phys. Res. A 621, 242 (2010)
F. Bridou, F. Delmotte, P. Troussel, B. Villette, Nucl. Instr. Meth. Phys. Res. A 680, 69 (2012)
D.L. Windt, E.M. Gullikson, C.C. Walton, Opt. Lett. 27, 2212 (2002)
K. Sakano, M. Yamamoto, Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, 238 (November 23, 1999)
F. Eriksson, G.A. Johansson, H.M. Hertz, E.M. Gullikson, U. Kreissig et al., Opt. Lett. 28, 2494 (2003)
F. Schäfers, M. Mertin, D. Abramsohn, A. Gaupp, H.C. Mertins et al., Nucl. Instr. Meth. Phys. Res. A 467, 349 (2001)
I.A. Artyukov, Y. Bugayev, O.Y. Devizenko, R.M. Feschenko, Y.S. Kasyanov et al., Proc. SPIE 5919, Soft X-ray Lasers and Applications VI, 59190E (September 13, 2005)
J.M. André, P. Jonnard, C. Michaelsen, J. Wiesmann, F. Bridou et al., X-ray Spectrom. 34, 203 (2005)
N.I. Chkhalo, S. Künstner, V.N. Polkovnikov, N.N. Salashchenko, F. Schäfers et al., Appl. Phys. Lett. 102, 011602 (2013)
M. Barthelmess, S. Bajt, Appl. Opt. 50, 1610 (2011)
C. Montcalm, B.T. Sullivan, S. Duguay, M. Ranger, W. Steffens et al., Opt. Lett. 20, 1450 (1995)
B. Sae-Lao, C. Montcalm, Opt. Lett. 26, 468 (2001)
C. Montcalm, S. Bajt, P.B. Mirkarimi, E.A. Spiller, F.J. Weber et al., Proc. SPIE 3331, Emerging Lithographic Technologies II, 42 (June 5, 1998)
T.W. Barbee Jr, S. Mrowka, M.C. Hettrick, Appl. Opt. 24, 883 (1985)
J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.F. Ravet et al., Appl. Opt. 44, 384 (2005)
D.L. Windt, J.A. Bellotti, B. Kjornrattanawanich, J.F. Seely, Appl. Opt. 48, 5502 (2009)
E. Meltchakov, C. Hecquet, M. Roulliay, S. De Rossi, Y. Menesguen et al., Appl. Phys. A 98, 111 (2010)
E. Meltchakov, A. Ziani, F. Auchère, X. Zhang, M. Roulliay et al., Proc. SPIE 8168, Advances in Optical Thin Films IV, 816819 (October 03, 2011)
T. Ejima, A. Yamazaki, T. Banse, K. Saito, Y. Kondo, S. Ichimaru, H. Takenaka, T. Ejima, Y. Kondo, M. Watanabe, Jpn. J. Appl. Phys. 40, 376 (2001)
M. Fernández-Perea, R. Soufli, J.C. Robinson, R. De Marcos, J.A. Méndez et al., Opt. Express 20, 24018 (2012)
Y.A. Uspenskii, S.V. Antonov, V.Y. Fedotov, A.V. Vinogradov, Proc. SPIE 3156, Soft X-ray Lasers and Applications II, 288 (November 1, 1997)
Y.A. Uspenskii, V.E. Levashov, A.V. Vinogradov, A.I. Fedorenko, V.V. Kondratenko et al., Nucl. Instr. Meth. Phys. Res. A 448, 147 (2000)
K.M. Skulina, C.S. Alford, R.M. Bionta, D.M. Makowiecki, E.M. Gullikson et al., Appl. Opt. 34, 3727 (1995)
S.A. Yulin, F. Schaefers, T. Feigl, N. Kaiser, Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, 155 (January 13, 2004)
A. Aquila, F. Salmassi, Y. Liu, E.M. Gullikson, Opt. Express 17, 22102 (2009)
J.I. Larruquert, J. Opt. Soc. Am. A 19, 385 (2002)
D.L. Windt, J.A. Bellotti, Appl. Opt. 48, 4932 (2009)
Q. Zhong, W. Li, Z. Zhang, J. Zhu, Q. Huang et al., Opt. Express 20, 10692 (2012)
J.M. Slaughter, B.S. Medower, R.N. Watts, C. Tarrio, T.B. Lucatorto et al., Opt. Lett. 19, 1786 (1994)
M. Grigonis, E.J. Knystautas, Appl. Opt. 36, 2839 (1997)
H. Hara, S. Nagata, R. Kano, K. Kumagai, T. Sakao et al., Appl. Opt. 38, 6617 (1999)
M.F. Ravet, F. Bridou, A. Raynal, B. Pardo, J.P. Chauvineau et al., J. Appl. Phys. 89, 1145 (2001)
D.L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, Appl. Opt. 43, 1835 (2004)
T. Feigl, S. Yulin, N. Benoit, N. Kaiser, Microelectron. Eng. 83, 703 (2006)
P. Billaud, M. Géléoc, Y.J. Picard, K. Veyrinas, J.F. Hergott et al., J. Phys. B: At. Mol. Opt. Phys. 45, 194013 (2012)
S. Bajt, H.N. Chapman, E. Spiller, S. Hau-Riege, J. Alameda et al., Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 65860J (May 18, 2007)
A. Jody Corso, P. Zuppella, D.L. Windt, M. Zangrando, M.G. Pelizzo, Opt. Express 20, 8006 (2012)
M.M.J.W. van Herpen, R.W.E. van de Kruijs, D.J.W. Klunder, E. Louis, A.E. Yakshin et al., Opt. Lett. 33, 560 (2008)
P. Billaud, M. Géléoc, F. Delmotte, M. Roulliay, Y.J. Picard et al., UVX 2012–11e Colloque sur les Sources Cohérentes et Incohérentes UV, VUV et X; Applications et Développements Récents, 01018, EDP Sciences (2013)
C. Hecquet, F. Delmotte, M.F. Ravet-Krill, S. de Rossi, A. Jérome et al., Appl. Phys. A 95, 401 (2009)
P. van Loevezijn, R. Schlatmann, J. Verhoeven, B.A. van Tiggelen, E.M. Gullikson, Appl. Opt. 35, 3614 (1996)
A.G. Michette, Z. Wang, Opt. Commun. 177, 47 (2000)
A.E. Yakshin, I.V. Kozhevnikov, E. Zoethout, E. Louis, F. Bijkerk, Opt. Express 18, 6957 (2010)
H. Maury, P. Jonnard, J.M. André, J. Gautier, M. Roulliay et al., Thin Solid Films 514, 278 (2006)
J. Gautier, F. Delmotte, M. Roulliay, M.F. Ravet, F. Bridou et al., Proc. SPIE 5963, Advances in Optical Thin Films II, 59630X (October 04, 2005)
S. Bajt, J.B. Alameda, T.W. Barbee Jr, W.M. Clift, J.A. Folta et al., Opt. Eng. 41, 1797 (2002)
H. Takenaka, H. Ito, T. Haga, T. Kawamura, J. Synchrotron Rad. 5, 708 (1998)
S. Braun, H. Mai, M. Moss, R. Scholz, A. Leson, Jpn. J. Appl. Phys. 41, 4074 (2002)
Y.P. Pershyn, E.N. Zubarev, V.V. Kondratenko, V.A. Sevryukova, S.V. Kurbatova, Appl. Phys. A 103, 1021 (2011)
E. Louis, A.E. Yakshin, T. Tsarfati, F. Bijkerk, Prog. Surf. Sci. 86, 255 (2011)
S. Bajt, N.V. Edwards, T.E. Madey, Surf. Sci. Rep. 63, 73 (2008)
M. Grisham, G. Vaschenko, C.S. Menoni, J.J. Rocca, Y.P. Pershyn et al., Opt. Lett. 29, 620 (2004)
S.P. Hau-Riege, R.A. London, R.M. Bionta, D. Ryutov, R. Soufli et al., Appl. Phys. Lett. 95, 111104 (2009)
E. Louis, A.R. Khorsand, R. Sobierajski, E.D. van Hattum, M. Jurek et al., Proc. SPIE 7361, Damage to VUV, EUV, and X-ray Optics II, 73610I (May 18, 2009)
A.R. Khorsand, R. Sobierajski, E. Louis, S. Bruijn, E.D. van Hattum et al., Opt. Express 18, 700 (2010)
R. Sobierajski, S. Bruijn, A.R. Khorsand, E. Louis, R.W.E. van de Kruijs et al., Opt. Express 19, 193 (2011)
R. López-Martens, K. Varjú, P. Johnsson, J. Mauritsson, Y. Mairesse et al., Phys. Rev. Lett. 94, 033001 (2005)
D.H. Ko, K.T. Kim, J. Park, J.H. Lee, C.H. Nam, New J. Phys. 12, 063008 (2010)
L. Poletto, F. Frassetto, P. Villoresi, J. Opt. Soc. Am. B 25, B133 (2008)
A. Wonisch, T. Westerwalbesloh, W. Hachmann, N. Kabachnik, U. Kleineberg et al., Thin Solid Films 464–465, 473 (2004)
A. Wonisch, U. Neuhäusler, N.M. Kabachnik, T. Uphues, M. Uiberacker et al., Appl. Opt. 45, 4147 (2006)
A.S. Morlens, P. Balcou, P. Zeitoun, C. Valentin, V. Laude et al., Opt. Lett. 30, 1554 (2005)
E. Goulielmakis, M. Schultze, M. Hofstetter, V.S. Yakovlev, J. Gagnon et al., Science 320, 1614 (2008)
R. Szipöcs, K. Ferencz, C. Spielmann, F. Krausz, Opt. Lett. 19, 201 (1994)
G. Steinmeyer, D.H. Sutter, L. Gallmann, N. Matuschek, U. Keller, Science 286, 1507 (1999)
M. Hofstetter, A. Aquila, M. Schultze, A. Guggenmos, S. Yang et al., New J. Phys. 13, 063038 (2011)
C. Bourassin-Bouchet, Z. Diveki, S. de Rossi, E. English, E. Meltchakov et al., Opt. Express 19, 3809 (2011)
A.L. Aquila, F. Salmassi, F. Dollar, Y. Liu, E. Gullikson, Opt. Express 14, 10073 (2006)
M. Suman, F. Frassetto, P. Nicolosi, M.G. Pelizzo, Appl. Opt. 46, 8159 (2007)
C. Bourassin-Bouchet, S. de Rossi, J. Wang, E. Meltchakov, A. Giglia et al., New J. Phys. 14, 023040 (2012)
S.V. Pepper, J. Opt. Soc. Am. 60, 805 (1970)
A. Aquila, F. Salmassi, E. Gullikson, Opt. Lett. 33, 455 (2008)
M. Suman, G. Monaco, M.G. Pelizzo, D.L. Windt, P. Nicolosi, Opt. Express 17, 7922 (2009)
M. Hofstetter, M. Schultze, M. Fieß, B. Dennhardt, A. Guggenmos et al., Opt. Express 19, 1767 (2011)
A.S. Morlens, R. López-Martens, O. Boyko, P. Zeitoun, P. Balcou et al., Opt. Lett. 31, 1558 (2006)
R.A. Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre et al., Opt. Lett. 36, 3386 (2011)
K. Zhao, Q. Zhang, M. Chini, Y. Wu, X. Wang et al., Opt. Lett. 37, 3891 (2012)
M. Schultze, E.M. Bothschafter, A. Sommer, S. Holzner, W. Schweinberger et al., Nature 493, 75 (2012)
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2015 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Bourassin-Bouchet, C., de Rossi, S., Delmotte, F. (2015). Multilayer Mirrors for Coherent Extreme-Ultraviolet and Soft X-ray Sources. In: Canova, F., Poletto, L. (eds) Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources. Springer Series in Optical Sciences, vol 197. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-47443-3_8
Download citation
DOI: https://doi.org/10.1007/978-3-662-47443-3_8
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-662-47442-6
Online ISBN: 978-3-662-47443-3
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)