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Quantitative Evaluation of Self-ordering in Anodic Porous Alumina

  • Chuan ChengEmail author
Chapter
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Part of the Springer Theses book series (Springer Theses)

Abstract

An important requirement for anodic porous alumina to be used as a template in synthesis of other nanomaterials, is that the in-plane arrangement of the nanopore channels should be self-ordered, because the self-ordered pattern corresponds to the growth of straight pore channels from top to bottom.

Keywords

Radial Distribution Function Anodic Porous Alumina Anodization Time Anodization Condition Porous Pattern 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

References

  1. 1.
    A.L. Friedman, L. Menon, J. Appl. Phys. 101, 084310 (2007)CrossRefGoogle Scholar
  2. 2.
    H. Asoh, K. Nishio, M. Nakao, T. Tamamura, H. Masuda, J. Electrochem. Soc. 148, B152 (2001)CrossRefGoogle Scholar
  3. 3.
    X.D. Li, G.W. Meng, S.Y. Qin, Q.L. Xu, Z.Q. Chu, X.G. Zhu, M.G. Kong, A.P. Li, ACS Nano 6, 831 (2012)CrossRefGoogle Scholar
  4. 4.
    H. Masuda, K. Fukuda, Science 268, 1466 (1995)CrossRefGoogle Scholar
  5. 5.
    Z. Su, W. Zhou, Adv. Mater. 20, 3663 (2008)CrossRefGoogle Scholar
  6. 6.
    C. Cheng, A.H.W. Ngan, Nanotechnology 24, 215602 (2013)CrossRefGoogle Scholar
  7. 7.
    C.K.Y. Ng, A.H.W. Ngan, Chem. Mater. 23, 5264 (2011)CrossRefGoogle Scholar
  8. 8.
    W. Lee, R. Ji, U. Gösele, K. Nielsch, Nat. Mater. 5, 741 (2006)CrossRefGoogle Scholar
  9. 9.
    K. Nielsch, J. Choi, K. Schwim, R.B. Wehrspohn, U. Gösele, Nano Lett. 2, 677 (2002)CrossRefGoogle Scholar
  10. 10.
    G. Beck, R. Bretzler, Mater. Chem. Phys. 128, 383 (2011)CrossRefGoogle Scholar
  11. 11.
    K.S. Napolskii, I.V. Roslyakov, A.Y. Romanchuk, O.O. Kapitanova, A.S. Mankevich, V.A. Lebedev, A.A. Eliseev, J. Mater. Chem. 22, 11922 (2012)CrossRefGoogle Scholar
  12. 12.
    C. Cheng, K.Y. Ng, A.H.W. Ngan, AIP Adv. 1, 042113 (2011)CrossRefGoogle Scholar
  13. 13.
    R. Hillebrand, F. Muller, K. Schwirn, W. Lee, M. Steinhart, ACS Nano 2, 913 (2008)CrossRefGoogle Scholar
  14. 14.
    S. Mátéfi-Tempfli, M. Mátéfi-Tempfli, L. Piraux, Thin Solid Films 516, 3735 (2008)CrossRefGoogle Scholar
  15. 15.
    A.C. Galca, E.S. Kooij, H. Wormeester, C. Salam, V. Leca, J.H. Rector, B. Poelsema, J. Appl. Phys. 94, 4296 (2003)CrossRefGoogle Scholar
  16. 16.
    W. Rasband, ImageJ, release 1.44, NIH: USA (2011) (public domain, http://rsb.info.nih.gov/ij/)
  17. 17.
    C.R. Simovski, P.A. Belov, A.V. Atrashchenko, Y.S. Kivshar, Adv. Mater. 24, 4229 (2012)CrossRefGoogle Scholar
  18. 18.
    D. Losic, M. Lillo, D. Losic, Small 5, 1392 (2009)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2015

Authors and Affiliations

  1. 1.The University of Hong KongHong KongChina

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