Abstract
As scientific and engineering interests in nanoscale structures increase, there is a strong need to fabricate nanometric surface and interface patterns with high regularity, reliability, and controllability. Formation of nanometric patterns on surfaces and thin films is often carried out with advanced nanolithography techniques, such as electron and ion beam lithography (Broers in Electrochem. Soc. 128:166, 1981; Ruchhoeft et al. in J. Vac. Sci. Technol. B 19:2529, 2001 [1, 2]), nanoimprint (Zhang and Chou in Appl. Phys. Lett. 79:845, 2001 [3]), X-ray lithography (Di Fabrizio et al. in J. Phys. Condens. Matters 16:S3517, 2004 [4]), and local scanning probe microscopy method (Tseng et al. in J. Vac. Sci. Technol. B 23:877, 2005 [5])
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Wei, J. (2015). Applications of Nonlinear Super-Resolution Effects in Nanolithography and High-Resolution Light Imaging. In: Nonlinear Super-Resolution Nano-Optics and Applications. Springer Series in Optical Sciences, vol 191. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-44488-7_9
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