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Trends of Laser Technology in Microelectronics

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Trends in Quantum Electronics

Abstract

One of the most effective applications of the laser technology is in the microelectronics. Today lasers are widely used in two main technological processes of the microelectronics (Fig. 1).

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References

  1. Metev, S.: (edit.) “Laser-assisted modification and sinthesis of materials” ( Sofia University, Sofia ) 1985

    Google Scholar 

  2. Metev. S., Savtchenko, S.: “Thermochemical action of laser radiation on thin metal films”, IEEE J. Quant. Electr. (1981) QE - 14, 2004

    Google Scholar 

  3. Metev, S., Savtchenko S, Stamenov, K.: “Pattern generation by laser-induced oxidation of thin metal films”, J. Phys. D: Appl. Phys. (1980) 13, 475

    Article  Google Scholar 

  4. Boyd, I.: “Laser-assisted formation of silicon dioxide films” in /1/, p. 105 and references therein

    Google Scholar 

  5. Gerassimov, R., Metev, S.. “Laser-induced decomposition of organometallic compounds”, Appl. Phys. B (1982) B 28 266

    Google Scholar 

  6. Bauerle, D.: (edit.) “Laser processing and diagnostics ( Springer Verlag, Heidelberg ) 1984

    Book  Google Scholar 

  7. Allen, S.: (edit.), S.: (edit.) “Laser-assisted deposition, etching and doping” (SPIE, Washington) 1984

    Google Scholar 

  8. Williams, B., Chin, H.: “Wafer-scale laser pantography: VI Direct-write interconnection of VLSI gate arrays” in /7/, p. 49

    Google Scholar 

  9. Tsao, J.Y., Ehrlich, D.S.: “Surface and gas processes in photodeposition in small zone” in /7/, p. 2

    Google Scholar 

  10. Deutsch, T.F., Ehrlich, D.J. “Electrical properties of laser chemically doped silicon”, App].. Phys. Lett. (1981) 39, No. 10, 825

    Article  ADS  Google Scholar 

  11. Ehrlich, T.F., Osgood, H.M., Liau, Z.L.: “Ohmic contact formation on InP by pulsed laser photochemical doping” Appl. Phys. Lett. (1980) 36, 847

    Article  ADS  Google Scholar 

  12. Ehrlich, D.J.: “One step repair of transparent defects in hardsuface photolithographic masks via laser photodeposition”, IEEE Electron Device Lett. (1980) EDL-1 101.

    Google Scholar 

  13. Osgood R.M., Brueck, S.R.J., Schlossberg, H.R, H.R.: “Laser diagnostics and photochemical processing for semiconductor devices” (North-Holland, NY) 1983

    Google Scholar 

  14. Ehrlich, D.J.: “Laser chemical technique for rapid direct writing of surface relief in silicon”, Appl. Phys. Lett. (1981) 1018

    Google Scholar 

  15. Houle, F.A.: “Laser-assisted chemical etching” in /7/, p. 110 and references therein

    Google Scholar 

  16. Osgood, R.M.: “Localized laser etching of compound semiconductors in aqueous solution” App]. Phys. Lett. (182) 40, 391

    Google Scholar 

  17. Johnson, A.W., Ehrlich, D.J., Schlossberg, H.R. (edit.): “Lasercontroled chemical processing of surfaces (North-Holland, N.Y.)

    Google Scholar 

  18. Khaibulin, I.B., Shtirkow, E.I.:“Laser annealing of implanted layers”, VINITI, No. 206174, 1974

    Google Scholar 

  19. Narayan, J., Brown, W.L., Lemons, R.A. (edit.): “Laser-solid interactions and transient thermal processing of materials” (North-Holland, N.Y.), 1983

    Google Scholar 

  20. Ryssel, H., Götzlich, J.: “Crystallization of deposited silicon on insulators for device application” Proc. I Int. Conf. on Pulsed Modification of Semicondustors“, Sept. 25–28, 1984, Dresden, GDR

    Google Scholar 

  21. Geis, M.W.: “Crystallographic orientation of Si on amorphous substrate using an artificial surface relief grating and laser crystallization”, Appl. Phys. Lett. (1979) 35, 71

    Article  ADS  Google Scholar 

  22. Colinge, J.P.: “Use of selective annealing for growing very large grain silicon on insulator films’’, Appl. Phys. Lett. (1982) 39, 1

    Google Scholar 

  23. Luches, A.: “Metal silicides formation with energy pulses” in /1/ p. 29

    Google Scholar 

  24. Baufay, L., Dispa, D.: “Laserinduced formation of CdTe Se semiconducting compounds”. Proc. Int. Conf. on IIVI Compounds April 1982, Dorham

    Google Scholar 

  25. Metev, S.: Unpublished results

    Google Scholar 

  26. Gaponov, S.V.: Laser film deposition“ in /1/ p. 216

    Google Scholar 

  27. Dimitrov, D., Metev, S.: “Properties of laser beam deposited thin polycomponent films” J. Mat. Sci. Lett. (1982) 1, 334

    Article  Google Scholar 

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Author information

Author notes

  1. S. Metev

    Present address: Max-Planck-Institut für Quantenoptik, 8046, Garching, Deutschland

Authors and Affiliations

  1. Faculty of Physics, Sofia University, Sofia, Bulgaria

    S. Metev

Authors
  1. S. Metev
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Editor information

Editors and Affiliations

  1. Institute of General Physics, Academy of Sciences, Vavilov Street 38, SU-117942, Moscow, Soviet Union

    A. M. Prokhorov

  2. Central Institute of Physics, P.O. Box MG6, Bucharest, Romania

    I. Ursu

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© 1986 Springer-Verlag Berlin Heidelberg

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Metev, S. (1986). Trends of Laser Technology in Microelectronics. In: Prokhorov, A.M., Ursu, I. (eds) Trends in Quantum Electronics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-10624-2_32

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  • DOI: https://doi.org/10.1007/978-3-662-10624-2_32

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-662-10626-6

  • Online ISBN: 978-3-662-10624-2

  • eBook Packages: Springer Book Archive

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