Abstract
Chemical etching of the ion-irradiated polymers is a process that transforms every latent track into a hole that, depending on conditions, may have a wide variety of shapes — long cylinders, short cones, hemispheres — and many others. All uses of ion-track etching are aimed either at getting information on the particles that created the tracks or at modifying the structure of the pristine monolithic polymer. In the former case the polymer serves as a detector and, sometimes, as a spectrometer. From the number, shapes and sizes of the tracks, one can determine the particle fluence, the composition of the particle flux, the angle of incidence and the energy of the particles. In other words, etching develops “fingerprints” of the particles passed through the polymer. Numerous applications of polymeric track detectors in nuclear physics, radiography, cosmic-ray studies, applied radiochemistry, dosimetry, etc., are based on this principle. In the latter case a particle beam with known parameters in combination with chemical etching serves as a unique and powerful microtool for the creation of a micro- or nanoporous structure. These two branches of track-etch methodology have been presented in books by Fleischer et al. [1] and by Spohr [2] that were comprehensive at their time of publication.
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Apel, P.Y., Fink, D. (2004). Ion-Track Etching. In: Transport Processes in Ion-Irradiated Polymers. Springer Series in Materials Science, vol 65. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-10608-2_4
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