Abstract
In insulating silicon nitride films, the dielectrical properties of silicon nitride are of primary importance, whereas in encapsulating and passivating silicon nitride films, the chemical barrier properties are utilized. Of course, the same film can serve more than one application. Some work on insulating silicon nitride films that is not directly related to a particular device is presented in this chapter.
Keywords
- Silicon Nitride
- Silicon Nitride Film
- Silicon Nitride Layer
- Selective Epitaxial Growth
- Molybdenum Silicide
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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© 1991 Springer-Verlag Berlin Heidelberg
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Krimmel, E.F., Hezel, R., Nohl, U., Bohrer, R. (1991). Insulating Silicon Nitride Films. In: Pebler, A., Schröder, F. (eds) Si Silicon. Si. Silicium. Silicon (System-Nr. 15), vol S-i / B / 1-5 / 5 / c. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-09901-8_4
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DOI: https://doi.org/10.1007/978-3-662-09901-8_4
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